Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24584729 | 1.00 | HPGD (0.46) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL24584550 | 1.00 | HPGD (0.46) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL24583813 | 1.00 | HPGD (0.46) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL8848663 | 0.89 | HPGD (0.40) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL677904 | 0.84 | HPGD (0.46) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL23481514 | 0.84 | TRPA1 (0.38) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL21509305 | 0.80 | HPGD (0.43) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL14646057 | 0.80 | HPGD (0.47) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL21665388 | 0.80 | HPGD (0.43) | HPGDLMNASMN1; SMN2POLBKMT2A | |
| SCHEMBL24170898 | 0.80 | HPGD (0.43) | HPGDLMNASMN1; SMN2POLBKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 646 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9126920-B2 | Method for producing 2-isopropylidene-5-methyl-4-hexenyl butyrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-08 | — | — | US | claimed |
| US-20150119597-A1 | METHOD FOR PRODUCING 2-ISOPROPYLIDENE-5-METHYL-4-HEXENYL BUTYRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-30 | — | — | US | claimed |
| EP-2202577-B1 | Chemically amplified positive resist composition and resist patterning process | SHINETSU CHEMICAL CO (JP) | 2014-08-27 | — | — | EP | claimed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | claimed |
| EP-0502839-B1 | Functionalized polymers | MONSANTO CO (US) | 1997-07-09 | — | — | EP | claimed |
| US-5294675-A | A-C copoly;hydroformylation | MONSANTO COMPANY (US) | 1994-03-15 | — | — | US | claimed |
| US-5232989-A | Hydroformylation of polyoefins, reduction to hydroxyl groups, reacting with diisocyanate | MONSANTO COMPANY (US) | 1993-08-03 | — | — | US | claimed |
| EP-0502839-A2 | Functionalized polymers | MONSANTO COMPANY (US) | 1992-09-09 | — | — | EP | claimed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240184200-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-06 | — | — | US | disclosed |
| US-20240134280-A1 | Polymer, Chemically Amplified Positive Resist Composition, Resist Patterning Process, And Mask Blank | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-25 | — | — | US | disclosed |
| US-20240118613-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20240116850-A1 | COMPOSITIONS AND METHODS RELATED TO BICYCLO[2.2.1] HEPTANAMINE-CONTAINING COMPOUNDS | THE BRIGHAM AND WOMEN'S HOSPITAL, INC. | 2024-04-11 | — | — | US | disclosed |
| US-11953827-B2 | Molecular resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-09 | — | — | US | disclosed |
| US-20020102493-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-08-01 | — | — | US | disclosed |
| US-20020091215-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-11 | — | — | US | disclosed |
| US-20020061463-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-23 | — | — | US | disclosed |
| EP-1195390-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-10 | — | — | EP | disclosed |
| US-20020007031-A1 | Novel ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-17 | — | — | US | disclosed |
| EP-1149825-A2 | Ester compounds, polymers, resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-10-31 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020007031-A1 | Novel ester compounds, polymers, resist compositions and patterning process | RER1, ARCN1, EMC1 | HPGD 4134/4885LMNA 1181/4885SMN1; SMN2 2517/4885 |
| US-20150119597-A1 | METHOD FOR PRODUCING 2-ISOPROPYLIDENE-5-METHYL-4-HEXENYL BUTYRATE | CYP8B1, HEXB, HPD | HPGD 520/4885LMNA 2840/4885SMN1; SMN2 2153/4885 |
| US-20240116850-A1 | COMPOSITIONS AND METHODS RELATED TO BICYCLO[2.2.1] HEPTANAMINE-CONTAINING COMPOUNDS | ANXA2, PHOSPHO1, CCNB2 | HPGD 1254/4885LMNA 717/4885SMN1; SMN2 1301/4885 |
| US-20240184200-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | ADAR, HNRNPU, POLQ | HPGD 4690/4885LMNA 1013/4885SMN1; SMN2 1541/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.