SCHEMBL5401430

SCHEMBL5401430

CC(C)c1ccc([I+](OS(=O)(=O)c2cc(Cl)ccc2Cl)c2ccc(C(C)C)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 1/20 0.38
ALDH1A1 P00352 4/20 0.37
MCL1 Q07820 3/20 0.37
KDM4E B2RXH2 1/20 0.37
L3MBTL1 Q9Y468 3/20 0.36
TSHR P16473 2/20 0.36
HPGD P15428 1/20 0.36
ALOX15 P16050 1/20 0.36
LMNA P02545 1/20 0.36
MAPT P10636 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
ALPL P05186 2/20 0.36
CNR2 P34972 2/20 0.36
ALPI P09923 1/20 0.36
PGR P06401 1/20 0.35
TP53 P04637 1/20 0.35
ACHE P22303 1/20 0.35
USP2 O75604 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5409969 0.86 TRPV4 (0.36) ALDH1A1L3MBTL1TSHRLMNAHTT
SCHEMBL5412177 0.86 TP53 (0.40) ALDH1A1MCL1KDM4EL3MBTL1TSHR
SCHEMBL5408741 0.83 HSD17B2 (0.41) ALDH1A1MCL1KDM4EL3MBTL1TSHR
SCHEMBL5400611 0.82 KDM4E (0.47) ALDH1A1MCL1KDM4EL3MBTL1TSHR
SCHEMBL5403649 0.82 TP53 (0.41) ALDH1A1MCL1KDM4EL3MBTL1TSHR
SCHEMBL5408470 0.80 GAA (0.40) RAB9AALDH1A1MCL1KDM4EL3MBTL1
SCHEMBL5406935 0.79 MCL1 (0.36) RAB9AALDH1A1MCL1KDM4EL3MBTL1
SCHEMBL5403656 0.77 MAPT (0.37) ALDH1A1LMNAMAPTTP53
SCHEMBL5404365 0.76 CNR2 (0.39) RAB9AALDH1A1L3MBTL1LMNAMAPT
SCHEMBL7896688 0.75 TYR (0.36) ALDH1A1KDM4EHPGDLMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed