SCHEMBL5403737

SCHEMBL5403737

O=S(=O)(c1ccc(Br)cc1)C(Br)(Br)Br

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.54
PLCG1 P19174 1/20 0.52
CA9 Q16790 5/20 0.48
MMP2 P08253 4/20 0.48
CA12 O43570 4/20 0.48
CA1 P00915 4/20 0.48
MMP1 P03956 1/20 0.48
MMP9 P14780 1/20 0.48
MMP8 P22894 1/20 0.48
MMP13 P45452 1/20 0.48
F2 P00734 2/20 0.43
PRSS1 P07477 2/20 0.43
PRSS2 P07478 2/20 0.43
PRSS3 P35030 2/20 0.43
IDO1 P14902 1/20 0.43
ALDH1A1 P00352 1/20 0.43
MAPK1 P28482 1/20 0.42
HTT P42858 1/20 0.42
CYP2A6 P11509 1/20 0.42
CA14 Q9ULX7 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14354527 0.89 ALDH1A1 (0.50) CA2PLCG1CA9MMP2CA12
SCHEMBL8745504 0.85 CA2 (0.50) CA2PLCG1CA9MMP2CA12
SCHEMBL14255285 0.80 ALDH1A1 (0.61) CA2PLCG1CA9MMP2CA12
SCHEMBL714645 0.80 CA2 (0.50) CA2PLCG1CA9MMP2CA12
SCHEMBL18968290 0.78 CA2 (0.48) CA2PLCG1CA9MMP2CA12
SCHEMBL753655 0.77 ALDH1A1 (0.56) CA2CA9MMP2CA12CA1
SCHEMBL2721589 0.77 LMNA (0.54) CA2CA9CA12CA1ALDH1A1
SCHEMBL753683 0.77 GAA (0.56) CA2CA9MMP2CA12CA1
SCHEMBL750671 0.77 ALDH1A1 (0.56) CA2CA9MMP2CA12CA1
SCHEMBL752983 0.77 GAA (0.56) CA2CA9MMP2CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4067998-B1 EO/PO MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZERS FOR USE IN PHOTOSENSITIVE RESINS IN THE MANUFACTURE OF PRINTED CIRCUIT BOARDS CHANGZHOU TRONLY NEW ELECTRONIC MAT CO LTD (CN) 2025-11-12 EP claimed
CN-116339074-B Photosensitive composition containing modified 9-phenylacridine photoinitiator 湖南五江高科技材料有限公司 2024-07-26 CN claimed
CN-116339074-A Photosensitive composition containing modified 9-phenylacridine photoinitiator 湖南五江高科技材料有限公司 2023-06-27 CN claimed
CN-112835261-B EO/PO modified 9-phenylacridine photosensitizer and application thereof 常州强力电子新材料股份有限公司 2022-06-07 CN claimed
CN-112835261-A EO/PO modified 9-phenylacridine photosensitizer and application thereof 常州强力电子新材料股份有限公司 2021-05-25 CN claimed
US-5401608-A Hydroxy-styrene and melamine derivative polymers HOECHST AKTIENGESELLSCHAFT (DE) 1995-03-28 US claimed
CN-116339074-B Photosensitive composition containing modified 9-phenylacridine photoinitiator 湖南五江高科技材料有限公司 2024-07-26 CN disclosed
CN-116339074-A Photosensitive composition containing modified 9-phenylacridine photoinitiator 湖南五江高科技材料有限公司 2023-06-27 CN disclosed
CN-112835261-B EO/PO modified 9-phenylacridine photosensitizer and application thereof 常州强力电子新材料股份有限公司 2022-06-07 CN disclosed
CN-112835261-A EO/PO modified 9-phenylacridine photosensitizer and application thereof 常州强力电子新材料股份有限公司 2021-05-25 CN disclosed
CN-1727996-B Improved image forming composition and method ROHM & HAAS ELECT MAT 2011-01-26 CN disclosed
CN-101218546-A Pattern forming method FUJIFILM CORP (JP) 2008-07-09 CN disclosed
US-7223519-B2 Xanthene senstitizers that affect color or shade change upon application of low energy; oxidizers, and aminocarboxylic acid amphoteric surfactant; may be peeled from workpiece in which they are coated; boats, vehicles ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2007-05-29 US disclosed
CN-1727996-A Improved image forming composition and method ROHM & HAAS ELECT MAT (US) 2006-02-01 CN disclosed
US-20050282084-A1 Imaging compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2005-12-22 US disclosed
US-20050266345-A1 Imaging compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2005-12-01 US disclosed
US-20050175931-A1 Imaging compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) 2005-08-11 US disclosed
EP-1562074-A1 Imaging compositions and methods Rohm and Haas Electronic Materials, L.L.C. (US) 2005-08-10 EP disclosed
US-5401608-A Hydroxy-styrene and melamine derivative polymers HOECHST AKTIENGESELLSCHAFT (DE) 1995-03-28 US disclosed
EP-0525625-A1 Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1993-02-03 EP disclosed