Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA7 | P43166 | 1/20 | 0.30 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.30 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6550547 | 0.81 | ALDH1A1 (0.30) | — | |
| SCHEMBL6550659 | 0.80 | HSD11B1 (0.37) | — | |
| SCHEMBL18641288 | 0.79 | CA1 (0.30) | CA1CA2CA7CA13EPHX1 | |
| SCHEMBL6728060 | 0.78 | HSD11B1 (0.39) | — | |
| SCHEMBL14119023 | 0.77 | — | — | |
| SCHEMBL6549785 | 0.77 | FFAR3 (0.31) | — | |
| SCHEMBL6550463 | 0.77 | CXCR2 (0.30) | — | |
| SCHEMBL758884 | 0.76 | CA2 (0.41) | CA1CA2CA7CA13 | |
| SCHEMBL160 | 0.76 | CA2 (0.41) | CA1CA2CA7CA13 | |
| SCHEMBL758883 | 0.76 | CA2 (0.41) | CA1CA2CA7CA13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109415602-B | 2-cyanoacrylate-based adhesive composition | 东亚合成株式会社 | 2021-05-25 | — | — | CN | disclosed |
| US-10793749-B2 | 2-cyanoacrylate-based adhesive composition | TOAGOSEI CO., LTD. (JP) | 2020-10-06 | — | — | US | disclosed |
| US-20190233679-A1 | 2-CYANOACRYLATE-BASED ADHESIVE COMPOSITION | TOAGOSEI CO., LTD. (JP) | 2019-08-01 | — | — | US | disclosed |
| US-7303785-B2 | Antireflective film material, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | disclosed |
| US-20040253461-A1 | Antireflective film material, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-16 | — | — | US | disclosed |