Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSPA5 | P11021 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | FABP3 | P05413 | 1/20 | 0.31 |
| ▸ | FABP4 | P15090 | 1/20 | 0.31 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2758459 | 0.83 | FABP3 (0.41) | HSPA5MEN1GAAKMT2AFABP3 | |
| SCHEMBL28510186 | 0.81 | FABP3 (0.39) | HSPA5MEN1GAAKMT2AFABP3 | |
| SCHEMBL28507973 | 0.81 | FABP3 (0.39) | HSPA5MEN1GAAKMT2AFABP3 | |
| SCHEMBL28499823 | 0.81 | FABP3 (0.39) | HSPA5MEN1GAAKMT2AFABP3 | |
| Succinimide SCHEMBL926918 | 0.79 | CRBN (0.40) | MEN1GAAKMT2AFABP3FABP4 | |
| SCHEMBL64832 | 0.73 | KMT2A (0.30) | KMT2A | |
| SCHEMBL65773 | 0.72 | GAA (0.47) | MEN1GAAKMT2AFABP4 | |
| SCHEMBL5405474 | 0.72 | PARL (0.46) | CYP1A2CYP3A4 | |
| SCHEMBL64827 | 0.69 | PARL (0.31) | — | |
| SCHEMBL16990203 | 0.69 | SPR (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7303785-B2 | Antireflective film material, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | disclosed |
| US-20040253461-A1 | Antireflective film material, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-16 | — | — | US | disclosed |