SCHEMBL5406839

SCHEMBL5406839

C=C(CCCCC(CCOc1ccccc1-c1ccccc1)OCCO)C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
HTT P42858 3/20 0.46
SMN1; SMN2 Q16637 3/20 0.46
KDM4E B2RXH2 13/20 0.45
ALDH1A1 P00352 9/20 0.45
KMT2A Q03164 3/20 0.43
GAA P10253 2/20 0.43
L3MBTL1 Q9Y468 2/20 0.43
MEN1 O00255 2/20 0.42
PKM P14618 1/20 0.42
POLB P06746 1/20 0.42
USP2 O75604 1/20 0.42
LMNA P02545 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6744564 0.84 KDM4E (0.48) HTTSMN1; SMN2KDM4EALDH1A1KMT2A
SCHEMBL6743567 0.83 KDM4E (0.46) HTTSMN1; SMN2KDM4EALDH1A1KMT2A
SCHEMBL19458668 0.83 KDM4E (0.60) HTTSMN1; SMN2KDM4EALDH1A1KMT2A
SCHEMBL9953483 0.82 KDM4E (0.59) HTTSMN1; SMN2KDM4EALDH1A1KMT2A
SCHEMBL19458858 0.82 KDM4E (0.59) HTTSMN1; SMN2KDM4EALDH1A1KMT2A
SCHEMBL450012 0.82 LMNA (0.58) HTTSMN1; SMN2KDM4EALDH1A1KMT2A
SCHEMBL156467 0.78 KDM4E (0.58) HTTSMN1; SMN2KDM4EALDH1A1KMT2A
SCHEMBL8939333 0.73 KDM4E (0.48) HTTSMN1; SMN2KDM4EALDH1A1KMT2A
SCHEMBL865586 0.72 ADRB2 (0.51) HTTSMN1; SMN2KDM4EALDH1A1KMT2A
SCHEMBL9335018 0.71 LTB4R (0.47) HTTSMN1; SMN2KDM4EALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7300687-B2 Retardation film and process for producing the same HAYASHI TELEMPU CO., LTD. (JP) 2007-11-27 US disclosed
US-20040166250-A1 Retardation film and process for producing the same HAYASHI TELEMPU CO., LTD 2004-08-26 US disclosed
US-6743487-B2 LAYER FORMED OF A MIXTURE OF A PHOTOSENSITIVE POLYMER AND A LOW MOLECULAR WEIGHT COMPOUND IS IRRADIATED WITH LIGHT TO ORIENT MOLECULES THEREBY DEVELOPING A RETARDATION AND THE DIRECTION OF THE OPTICAL AXIS HAYASHI TELEMPU CO., LTD. (JP) 2004-06-01 US disclosed
US-6696114-B1 POLARIZED ULTRAVIOLET RADIATED HYDROCARBON, (METH)ACRYLATE, OR SILOXANE POLYMER HAYASHI TELEMPU CO., LTD. (JP) 2004-02-24 US disclosed
US-20020128341-A1 Retardation film and process for producing the same HAYASHI TELEMPU CO., LTD 2002-09-12 US disclosed