SCHEMBL5406935

SCHEMBL5406935

CCC(C)(C)c1ccc([I+](OS(=O)(=O)c2cc(Cl)ccc2Cl)c2ccc(C(C)(C)CC)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MCL1 Q07820 3/20 0.36
MAPT P10636 3/20 0.36
ALDH1A1 P00352 3/20 0.35
L3MBTL1 Q9Y468 2/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
HSD11B1 P28845 3/20 0.34
KDM4E B2RXH2 1/20 0.34
GAA P10253 1/20 0.34
HPGD P15428 1/20 0.33
TSHR P16473 1/20 0.33
LMNA P02545 1/20 0.33
HTT P42858 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
FBP1 P09467 1/20 0.33
ALPL P05186 1/20 0.33
ALPI P09923 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5404679 0.87 NPC1 (0.36) MAPTL3MBTL1NPC1RAB9ALMNA
SCHEMBL5408741 0.87 HSD17B2 (0.41) MCL1ALDH1A1L3MBTL1HSD11B1KDM4E
SCHEMBL5403649 0.83 TP53 (0.41) MCL1MAPTALDH1A1L3MBTL1KDM4E
SCHEMBL5412177 0.81 TP53 (0.40) MCL1MAPTALDH1A1L3MBTL1KDM4E
SCHEMBL5408470 0.81 GAA (0.40) MCL1MAPTALDH1A1L3MBTL1RAB9A
SCHEMBL5401430 0.79 RAB9A (0.38) MCL1MAPTALDH1A1L3MBTL1RAB9A
SCHEMBL5400611 0.78 KDM4E (0.47) MCL1ALDH1A1L3MBTL1KDM4EGAA
SCHEMBL5398691 0.78 NPC1 (0.35) MAPTALDH1A1NPC1RAB9AKDM4E
SCHEMBL5416235 0.77 NPC1 (0.38) MAPTNPC1RAB9AHSD11B1TSHR
SCHEMBL4389993 0.74 NPC1 (0.38) MAPTNPC1RAB9ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed