Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | F2 | P00734 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.36 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.36 |
| ▸ | PGR | P06401 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5403649 | 0.90 | TP53 (0.41) | GAAMAPTF2ALDH1A1KDM4E | |
| SCHEMBL5412226 | 0.87 | CA2 (0.36) | GAAMAPTALDH1A1KDM4EPOLB | |
| SCHEMBL5412177 | 0.82 | TP53 (0.40) | MAPTALDH1A1KDM4EL3MBTL1MCL1 | |
| SCHEMBL5406935 | 0.81 | MCL1 (0.36) | GAAMAPTALDH1A1KDM4EL3MBTL1 | |
| SCHEMBL5408741 | 0.80 | HSD17B2 (0.41) | ALDH1A1KDM4EL3MBTL1MCL1 | |
| SCHEMBL5401430 | 0.80 | RAB9A (0.38) | MAPTALDH1A1KDM4EPGRL3MBTL1 | |
| SCHEMBL5400611 | 0.79 | KDM4E (0.47) | GAAALDH1A1KDM4EPOLBL3MBTL1 | |
| SCHEMBL5411397 | 0.76 | KAT6A (0.40) | GAAPOLBCA2RAB9A | |
| SCHEMBL5414726 | 0.76 | TP53 (0.35) | MAPTF2ALDH1A1KDM4EPOLB | |
| SCHEMBL5411400 | 0.71 | CA2 (0.43) | GAAALDH1A1L3MBTL1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |