Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | AR | P10275 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.40 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | ACLY | P53396 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5412177 | 0.85 | TP53 (0.40) | KDM4EMCL1ALDH1A1L3MBTL1TSHR | |
| SCHEMBL5400412 | 0.84 | PGR (0.42) | ALDH1A1L3MBTL1 | |
| SCHEMBL5401430 | 0.82 | RAB9A (0.38) | KDM4EMCL1ALDH1A1L3MBTL1TSHR | |
| SCHEMBL5408741 | 0.82 | HSD17B2 (0.41) | KDM4EMCL1ALDH1A1L3MBTL1TSHR | |
| SCHEMBL5403649 | 0.81 | TP53 (0.41) | KDM4EPOLBMCL1ALDH1A1GAA | |
| SCHEMBL5408470 | 0.79 | GAA (0.40) | KDM4EPOLBMCL1ALDH1A1GAA | |
| SCHEMBL5406935 | 0.78 | MCL1 (0.36) | KDM4EMCL1ALDH1A1GAAL3MBTL1 | |
| SCHEMBL5407041 | 0.73 | KMT2A (0.43) | POLBALDH1A1L3MBTL1MEN1KMT2A | |
| SCHEMBL2898544 | 0.73 | TDP1 (0.56) | ALDH1A1GAAL3MBTL1MEN1KMT2A | |
| SCHEMBL561670 | 0.73 | KDM4E (0.48) | KDM4EPOLBMCL1ALDH1A1AR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7312014-B2 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040170918-A1 | Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1406123-A1 | RESIST COMPOSITIONS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-04-07 | — | — | EP | disclosed |