Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.46 |
| ▸ | HTT | P42858 | 4/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.41 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.40 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.40 |
| ▸ | TEAD4 | Q15561 | 1/20 | 0.39 |
| ▸ | GPR3 | P46089 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.38 |
| ▸ | MMP2 | P08253 | 1/20 | 0.37 |
| ▸ | MMP9 | P14780 | 1/20 | 0.37 |
| ▸ | AR | P10275 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | CA9 | Q16790 | 1/20 | 0.37 |
| ▸ | BCHE | P06276 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL4643748 | 0.92 | HTT (0.40) | SMN1; SMN2HTTTDP1L3MBTL1KCNH2 | |
| Trifluoromethanesulfonic Acid SCHEMBL36224 | 0.90 | GPR3 (0.44) | SMN1; SMN2KCNH2FFAR1GPR3ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL2901812 | 0.89 | ACHE (0.47) | KCNH2ALDH1A1MAPTBCHEACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL8862157 | 0.86 | BCHE (0.40) | SMN1; SMN2HTTKCNH2GPR3ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL5427818 | 0.85 | SOS1 (0.43) | SMN1; SMN2HTTFFAR1PTPN1GPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL5436738 | 0.84 | ALDH1A1 (0.45) | SMN1; SMN2HTTPTPN1ALDH1A1MAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL51417 | 0.84 | SOS1 (0.46) | SMN1; SMN2HTTFFAR1PTPN1GPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL31720833 | 0.84 | KCNH2 (0.43) | SMN1; SMN2HTTKCNH2GPR3ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL2324715 | 0.84 | KCNH2 (0.43) | SMN1; SMN2HTTKCNH2GPR3ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL9135540 | 0.83 | ACHE (0.45) | L3MBTL1KCNH2GPR3ALDH1A1CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070072120-A1 | Method for producing resin for chemically amplified positive resist | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| US-7144674-B2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-12-05 | — | — | US | disclosed |
| US-7129014-B2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20060073411-A1 | Chemically amplified resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-04-06 | — | — | US | disclosed |
| US-6893792-B2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-05-17 | — | — | US | disclosed |
| US-20040191674-A1 | Chemical amplification resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-09-30 | — | — | US | disclosed |
| US-6762007-B2 | A BLENDS COMPRISING A PARTIALLY ETHERIFIED POLYHYDROXYSTYRENE-P AND A PARTIALLY ESTERIFIED POLYHYDROXYSTYRENE-P WITH PIVALIC ACID, AN ACID GENERATORS; PHOTOLITHOGRAPHY ACTIVATED BY HIGH-ENERGY ULTRAVIOLET RAY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-07-13 | — | — | US | disclosed |
| US-20030236351-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITIED (JP) | 2003-12-25 | — | — | US | disclosed |
| US-20030194639-A1 | Positive resist composition | FORTINET, INC. | 2003-10-16 | — | — | US | disclosed |
| US-20030180663-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY (JP) | 2003-09-25 | — | — | US | disclosed |