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Sugi Predict / Compounds / Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL5436738

CC(C)(C)c1ccc([S+](c2ccc(Oc3ccc([S+](c4ccc(C(C)(C)C)cc4)c4ccc(C(C)(C)C)cc4)cc3)cc2)c2ccc(C(C)(C)C)cc2)cc1.O=S(=O)([O-])C(F)(F)F.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.45

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.45
▸ MAPT P10636 2/20 0.45
▸ NPC1 O15118 1/20 0.45
▸ HPGD P15428 1/20 0.45
▸ MAPK1 P28482 1/20 0.45
▸ RAB9A P51151 1/20 0.45
▸ CA1 P00915 1/20 0.42
▸ CA2 P00918 1/20 0.42
▸ CA9 Q16790 1/20 0.42
▸ PTPN1 P18031 1/20 0.38
▸ MEN1 O00255 1/20 0.38
▸ RECQL P46063 1/20 0.38
▸ KMT2A Q03164 1/20 0.38
▸ FDFT1 P37268 1/20 0.37
▸ CYP1A2 P05177 1/20 0.37
▸ CYP3A4 P08684 1/20 0.37
▸ GAA P10253 1/20 0.37
▸ CYP2C9 P11712 1/20 0.37
▸ CYP2C19 P33261 1/20 0.37
▸ SMN1; SMN2 Q16637 4/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL36543 0.91 ALDH1A1 (0.46) ALDH1A1MAPTNPC1HPGDMAPK1
SCHEMBL5438873 0.86 ALDH1A1 (0.39) ALDH1A1MAPTNPC1HPGDMAPK1
Trifluoromethanesulfonic Acid SCHEMBL5433012 0.84 SMN1; SMN2 (0.46) ALDH1A1MAPTCA1CA2CA9
Trifluoromethanesulfonic Acid SCHEMBL3136704 0.84 HSD11B1 (0.41) ALDH1A1MAPTNPC1RAB9ACA1
Trifluoromethanesulfonic Acid SCHEMBL51512 0.84 HSD11B1 (0.41) ALDH1A1MAPTNPC1RAB9ACA1
SCHEMBL685356 0.83 RAB9A (0.61) ALDH1A1MAPTNPC1HPGDMAPK1
SCHEMBL686236 0.83 RAB9A (0.61) ALDH1A1MAPTNPC1HPGDMAPK1
Trifluoromethanesulfonic Acid SCHEMBL5427818 0.83 SOS1 (0.43) ALDH1A1CA1CA2CA9PTPN1
SCHEMBL2434949 0.82 ALDH1A1 (0.44) ALDH1A1MAPTNPC1HPGDMAPK1
SCHEMBL29745790 0.82 ALDH1A1 (0.44) ALDH1A1MAPTNPC1HPGDMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070072120-A1 Method for producing resin for chemically amplified positive resist SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2007-03-29 — — US disclosed
US-7144674-B2 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-12-05 — — US disclosed
US-7129014-B2 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-10-31 — — US disclosed
US-20060073411-A1 Chemically amplified resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-04-06 — — US disclosed
US-6762007-B2 A BLENDS COMPRISING A PARTIALLY ETHERIFIED POLYHYDROXYSTYRENE-P AND A PARTIALLY ESTERIFIED POLYHYDROXYSTYRENE-P WITH PIVALIC ACID, AN ACID GENERATORS; PHOTOLITHOGRAPHY ACTIVATED BY HIGH-ENERGY ULTRAVIOLET RAY SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-07-13 — — US disclosed
US-20030236351-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITIED (JP) 2003-12-25 — — US disclosed
US-20030219677-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY (JP) 2003-11-27 — — US disclosed
US-20030180663-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY (JP) 2003-09-25 — — US disclosed