SCHEMBL5456788

SCHEMBL5456788

CCCS(=O)(=O)ON=C(c1ccccc1C)C(Cl)(Cl)C(=O)COC

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 3/20 0.33
THRB P10828 1/20 0.33
KDM4E B2RXH2 2/20 0.32
ALDH1A1 P00352 1/20 0.32
HPGD P15428 1/20 0.32
KMT2A Q03164 2/20 0.31
HSD17B10 Q99714 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
LMNA P02545 1/20 0.31
MAPT P10636 1/20 0.31
HTT P42858 1/20 0.31
NPC1 O15118 1/20 0.30
RAB9A P51151 1/20 0.30
CCNB2 O95067 1/20 0.30
CCNE2 O96020 1/20 0.30
CDK1 P06493 1/20 0.30
CCNB1 P14635 1/20 0.30
CCNE1 P24864 1/20 0.30
CDK2 P24941 1/20 0.30
CCNB3 Q8WWL7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4901942 0.84 L3MBTL1 (0.33) L3MBTL1THRBKMT2ASMN1; SMN2LMNA
SCHEMBL4897601 0.82 L3MBTL1 (0.35) L3MBTL1THRBALDH1A1KMT2AHSD17B10
SCHEMBL4901322 0.78 NPC1 (0.36) L3MBTL1THRBKDM4EALDH1A1HPGD
SCHEMBL4897515 0.74 KMT2A (0.35) L3MBTL1ALDH1A1HPGDKMT2AHSD17B10
SCHEMBL4903386 0.65 LMNA (0.33) L3MBTL1KDM4EALDH1A1HPGDKMT2A
SCHEMBL4900868 0.65 KMT2A (0.34) L3MBTL1ALDH1A1HPGDKMT2AHSD17B10
SCHEMBL546604 0.65 CNR2 (0.39) L3MBTL1KDM4EHPGD
SCHEMBL546605 0.65 CNR2 (0.39) L3MBTL1KDM4EHPGD
SCHEMBL4902630 0.64 NPSR1 (0.43) THRBHPGDKMT2AHSD17B10SMN1; SMN2
SCHEMBL4901776 0.63 NPSR1 (0.34) ALDH1A1HPGDKMT2AHSD17B10SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US claimed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US claimed
US-20070269735-A1 Radiation-Sensitive Resin Composition JSR CORPORATION (JP) 2007-11-22 US disclosed
EP-1726608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2006-11-29 EP disclosed
US-6824954-B2 DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS JSR CORPORATION (JP) 2004-11-30 US disclosed
US-20030113660-A1 Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same JSR CORPORATION (JP) 2003-06-19 US disclosed