Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.66 |
| ▸ | CA1 | P00915 | 1/20 | 0.63 |
| ▸ | CA2 | P00918 | 1/20 | 0.63 |
| ▸ | PLAU | P00749 | 3/20 | 0.58 |
| ▸ | PLG | P00747 | 1/20 | 0.58 |
| ▸ | PLAT | P00750 | 1/20 | 0.58 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.56 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.55 |
| ▸ | HPGD | P15428 | 1/20 | 0.55 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.55 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.55 |
| ▸ | CASP3 | P42574 | 2/20 | 0.55 |
| ▸ | SENP7 | Q9BQF6 | 2/20 | 0.55 |
| ▸ | MEN1 | O00255 | 2/20 | 0.55 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.55 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1856468 | 0.96 | KDM4E (0.70) | KDM4ECA1CA2PLAUPLG | |
| SCHEMBL709231 | 0.89 | LCK (0.62) | KDM4ECA1CA2CYP11B1CYP11B2 | |
| SCHEMBL9979782 | 0.87 | PTPN11 (0.64) | KDM4ECA1CA2PLAUCYP11B1 | |
| SCHEMBL69025 | 0.87 | PTPN11 (0.68) | KDM4ECA1CA2PLAUCYP11B1 | |
| SCHEMBL29365729 | 0.87 | PTPN11 (0.68) | KDM4ECA1CA2PLAUCYP11B1 | |
| SCHEMBL7558803 | 0.86 | CA1 (0.65) | KDM4ECA1CA2PLAUPLG | |
| SCHEMBL12744132 | 0.86 | KDM4E (0.62) | KDM4ECA1CA2PLAUPLG | |
| SCHEMBL8698483 | 0.85 | KDM4E (0.70) | KDM4ECA1CA2PLAUPLG | |
| SCHEMBL8732524 | 0.85 | PTPN11 (0.66) | KDM4ECA1CA2PLAUCYP11B1 | |
| SCHEMBL4940300 | 0.84 | KDM4E (0.55) | KDM4ECA1CA2PLAUPLG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1549598-A4 | NAPTHTHALENE DERIVATIVES WHICH INHIBIT THE CYTOKINE OR BIOLOGICAL ACTIVITY OF MACROPHAGE MIGRATION INHIBITORY FACTOR (MIF) | CORTICAL PTY LTD (AU) | 2008-01-23 | — | — | EP | claimed |
| US-20060106102-A1 | Napththalene derivatives which inhibit the cytokine or biological activity of microphage migration inhibitory factor (mif) | Morand, Eric | 2006-05-18 | — | — | US | claimed |
| EP-1549598-A1 | NAPTHTHALENE DERIVATIVES WHICH INHIBIT THE CYTOKINE OR BIOLOGICAL ACTIVITY OF MACROPHAGE MIGRATION INHIBITORY FACTOR (MIF) | Cortical Pty Ltd (AU) | 2005-07-06 | — | — | EP | claimed |
| WO-2003104178-A1 | NAPTHTHALENE DERIVATIVES WHICH INHIBIT THE CYTOKINE OR BIOLOGICAL ACTIVITY OF MACROPHAGE MIGRATION INHIBITORY FACTOR (MIF) | CORTICAL PTY LTD (AU) | 2003-12-18 | — | — | WO | claimed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| CN-105451737-B | Medical composition and its use and described pharmaceutical composition are used for the application process practised contraception on demand | 拜耳医药股份有限公司 | 2018-04-10 | — | — | CN | disclosed |
| US-20070149533-A1 | Bicyclic compounds with kinase inhibitory activity | MILLENNIUM PHARMACEUTICALS, INC. (US) | 2007-06-28 | — | — | US | disclosed |
| US-20070149533-A1 | Bicyclic compounds with kinase inhibitory activity | MILLENNIUM PHARMACEUTICALS, INC. (US) | 2007-06-28 | — | — | US | disclosed |
| WO-2007067444-A1 | BICYCLIC COMPOUNDS WITH KINASE INHIBITORY ACTIVITY | MILLENNIUM PHARMACEUTICALS, INC. (US) | 2007-06-14 | — | — | WO | disclosed |
| EP-1791969-A2 | A METHOD OF TREATING CANCER | Merck & Co., Inc. (US) | 2007-06-06 | — | — | EP | disclosed |
| US-20060106102-A1 | Napththalene derivatives which inhibit the cytokine or biological activity of microphage migration inhibitory factor (mif) | Morand, Eric | 2006-05-18 | — | — | US | disclosed |
| WO-2006031607-A2 | A METHOD OF TREATING CANCER | MERCK & CO., INC. (US) | 2006-03-23 | — | — | WO | disclosed |
| EP-1549598-A1 | NAPTHTHALENE DERIVATIVES WHICH INHIBIT THE CYTOKINE OR BIOLOGICAL ACTIVITY OF MACROPHAGE MIGRATION INHIBITORY FACTOR (MIF) | Cortical Pty Ltd (AU) | 2005-07-06 | — | — | EP | disclosed |
| WO-2003104178-A1 | NAPTHTHALENE DERIVATIVES WHICH INHIBIT THE CYTOKINE OR BIOLOGICAL ACTIVITY OF MACROPHAGE MIGRATION INHIBITORY FACTOR (MIF) | CORTICAL PTY LTD (AU) | 2003-12-18 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | ASIC1, ASIC3, CLTA | KDM4E 3345/4885CA1 50/4885CA2 53/4885 |
| US-20060106102-A1 | Napththalene derivatives which inhibit the cytokine or biological activity of microphage migration inhibitory factor (mif) | MIF, ARG1, MSR1 | KDM4E 3166/4885CA1 2883/4885CA2 3698/4885 |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | SLC11A2, XRCC5, RAD54L | KDM4E 4396/4885CA1 203/4885CA2 529/4885 |
| US-20070149533-A1 | Bicyclic compounds with kinase inhibitory activity | MAP3K20, MAP3K1, MAP3K5 | KDM4E 1104/4885CA1 4184/4885CA2 1767/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.