SCHEMBL546502

SCHEMBL546502

O=C(OCCSCCCl)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.31

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.31
KMT2A Q03164 3/20 0.31
HTT P42858 2/20 0.31
MEN1 O00255 2/20 0.31
TSHR P16473 1/20 0.31
MAPT P10636 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HSD17B10 Q99714 1/20 0.31
CHRM2 P08172 2/20 0.30
CHRM1 P11229 2/20 0.30
CHRM3 P20309 2/20 0.30
POLB P06746 1/20 0.30
CHRM4 P08173 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547030 0.84 TDP1 (0.35) MAPK1KMT2AHTTMEN1TSHR
SCHEMBL547319 0.83 HDAC1 (0.36) MAPK1KMT2AHTTMEN1TSHR
SCHEMBL547134 0.83 KMT2A (0.34) MAPK1KMT2AHTTMEN1TSHR
SCHEMBL546807 0.83 HDAC1 (0.36) MAPK1KMT2AHTTMEN1TSHR
SCHEMBL546506 0.83 HDAC1 (0.36) MAPK1KMT2AHTTMEN1TSHR
SCHEMBL547233 0.82 KMT2A (0.36) MAPK1KMT2AHTTMEN1TSHR
SCHEMBL547387 0.80 KMT2A (0.36) MAPK1KMT2AHTTMEN1TSHR
SCHEMBL546389 0.80 HSD11B1 (0.34) KMT2AMEN1
SCHEMBL546522 0.79 CA12 (0.34) KMT2AMEN1
SCHEMBL547331 0.79 CA12 (0.34) KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed