SCHEMBL547134

SCHEMBL547134

O=C(OCCOCCOCCCl)C(F)(F)S(=O)(=O)OS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.34
HTT P42858 2/20 0.32
MEN1 O00255 2/20 0.32
MAPK1 P28482 2/20 0.32
TSHR P16473 2/20 0.32
GAA P10253 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
ALDH1A1 P00352 3/20 0.32
MAPT P10636 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
HSD17B10 Q99714 1/20 0.32
POLB P06746 3/20 0.32
CHRM2 P08172 1/20 0.32
CHRM1 P11229 1/20 0.32
CHRM3 P20309 1/20 0.32
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547030 0.86 TDP1 (0.35) KMT2AHTTMEN1MAPK1TSHR
SCHEMBL546506 0.85 HDAC1 (0.36) KMT2AHTTMEN1MAPK1TSHR
SCHEMBL547319 0.85 HDAC1 (0.36) KMT2AHTTMEN1MAPK1TSHR
SCHEMBL546807 0.85 HDAC1 (0.36) KMT2AHTTMEN1MAPK1TSHR
SCHEMBL547233 0.84 KMT2A (0.36) KMT2AHTTMEN1MAPK1TSHR
SCHEMBL546502 0.83 MAPK1 (0.31) KMT2AHTTMEN1MAPK1TSHR
SCHEMBL547387 0.82 KMT2A (0.36) KMT2AHTTMEN1MAPK1TSHR
SCHEMBL546389 0.81 HSD11B1 (0.34) KMT2AMEN1ALDH1A1CA1CA2
SCHEMBL547331 0.81 CA12 (0.34) KMT2AMEN1ALDH1A1CA1CA2
SCHEMBL546522 0.81 CA12 (0.34) KMT2AMEN1ALDH1A1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524440-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-03 US disclosed
US-8110336-B2 Resin and chemically amplified resist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-07 US disclosed
US-20110165513-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LTD (JP) 2011-07-07 US disclosed
US-20100075257-A1 Resin and Chemically Amplified Resist Composition Comprising the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-25 US disclosed