Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL546524 | 0.80 | — | — | |
| SCHEMBL15659577 | 0.80 | SCN9A (0.38) | KMT2AALDH1A1GAANPC1RAB9A | |
| SCHEMBL17063683 | 0.80 | SCN9A (0.38) | KMT2AALDH1A1GAANPC1RAB9A | |
| SCHEMBL961708 | 0.79 | KMT2A (0.37) | KMT2AALDH1A1GAANPC1RAB9A | |
| SCHEMBL546894 | 0.76 | — | — | |
| SCHEMBL14778377 | 0.74 | SCN9A (0.36) | ALDH1A1GAANPC1RAB9A | |
| SCHEMBL961481 | 0.72 | ALDH1A1 (0.35) | KMT2AALDH1A1GAANPC1RAB9A | |
| SCHEMBL547384 | 0.70 | MAPK1 (0.32) | KMT2AGAASMN1; SMN2 | |
| SCHEMBL785676 | 0.69 | SCN9A (0.35) | KMT2AALDH1A1GAA | |
| SCHEMBL515602 | 0.69 | P2RX7 (0.37) | KMT2AALDH1A1GAANPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524440-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-03 | — | — | US | disclosed |
| US-8110336-B2 | Resin and chemically amplified resist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20110165513-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LTD (JP) | 2011-07-07 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |