Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.68 |
| ▸ | HTT | P42858 | 2/20 | 0.68 |
| ▸ | LMNA | P02545 | 2/20 | 0.68 |
| ▸ | ESR1 | P03372 | 1/20 | 0.68 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.68 |
| ▸ | PKM | P14618 | 1/20 | 0.68 |
| ▸ | HPGD | P15428 | 1/20 | 0.68 |
| ▸ | SIRT1 | Q96EB6 | 1/20 | 0.63 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.59 |
| ▸ | POLB | P06746 | 2/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.58 |
| ▸ | CA12 | O43570 | 2/20 | 0.58 |
| ▸ | CA1 | P00915 | 2/20 | 0.58 |
| ▸ | CA2 | P00918 | 2/20 | 0.58 |
| ▸ | GAA | P10253 | 2/20 | 0.58 |
| ▸ | CA7 | P43166 | 2/20 | 0.58 |
| ▸ | CA9 | Q16790 | 2/20 | 0.58 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.58 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.58 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1758192 | 0.91 | CA12 (0.68) | MAPTHTTLMNAESR1ESR2 | |
| SCHEMBL9131523 | 0.89 | FASN (0.66) | MAPTHTTLMNAESR1ESR2 | |
| SCHEMBL31257839 | 0.84 | L3MBTL1 (0.64) | MAPTLMNAESR1ESR2SIRT1 | |
| SCHEMBL142204 | 0.84 | L3MBTL1 (0.64) | MAPTLMNAESR1ESR2SIRT1 | |
| SCHEMBL8861226 | 0.84 | SIRT1 (0.56) | MAPTHTTLMNAESR1ESR2 | |
| SCHEMBL6742077 | 0.83 | SIRT1 (0.59) | MAPTLMNAHPGDSIRT1POLB | |
| SCHEMBL30006432 | 0.83 | MAPK1 (0.63) | MAPTHPGDSIRT1POLBL3MBTL1 | |
| SCHEMBL6839571 | 0.83 | ALDH1A1 (0.67) | MAPTHTTLMNASIRT1SMN1; SMN2 | |
| SCHEMBL6746043 | 0.83 | MAPK1 (0.63) | MAPTHPGDSIRT1POLBL3MBTL1 | |
| SCHEMBL6744685 | 0.83 | SIRT1 (0.59) | MAPTHTTLMNAESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12044969-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-12044969-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| US-20220146939-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2022-05-12 | — | — | US | disclosed |
| US-11287741-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2022-03-29 | — | — | US | disclosed |
| US-20210311396-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2021-10-07 | — | — | US | disclosed |
| US-20200201184-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2020-06-25 | — | — | US | disclosed |
| US-20090278073-A1 | POLYMERIC MEA FOR FUEL CELL | HYUNDAI MOTOR COMPANY (KR) | 2009-11-12 | — | — | US | disclosed |
| US-20090278073-A1 | POLYMERIC MEA FOR FUEL CELL | HYUNDAI MOTOR COMPANY (KR) | 2009-11-12 | — | — | US | disclosed |
| US-20070172755-A1 | Positive photoresist and method for producing structure | SEKISUI CHECMICAL CO., LTD. (JP) | 2007-07-26 | — | — | US | disclosed |
| EP-1239332-B1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF | AZ ELECTRONIC MATERIALS USA (US) | 2007-02-21 | — | — | EP | disclosed |
| EP-0550009-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-07-07 | — | — | EP | disclosed |
| EP-0528401-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-02-24 | — | — | EP | disclosed |
| US-5188920-A | Photosensitivity, resolution, heat resistance, adhesiveness | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-02-23 | — | — | US | disclosed |
| EP-0525185-A1 | POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1993-02-03 | — | — | EP | disclosed |
| EP-0510670-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-28 | — | — | EP | disclosed |
| EP-0510671-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-28 | — | — | EP | disclosed |
| US-5130225-A | And alkali soluble resin, a quinone oxazide compound and a hydroxyl containing compound, film thickness retention | SUMITOMO CHEMICAL CO. LTD. (JP) | 1992-07-14 | — | — | US | disclosed |
| EP-0461388-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0461654-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0460416-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-11 | — | — | EP | disclosed |