Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | LTA4H | P09960 | 2/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | PPARG | P37231 | 1/20 | 0.38 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.38 |
| ▸ | CES2 | O00748 | 1/20 | 0.38 |
| ▸ | CES1 | P23141 | 1/20 | 0.38 |
| ▸ | BACE1 | P56817 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.36 |
| ▸ | PGR | P06401 | 1/20 | 0.36 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5477402 | 0.95 | PKM (0.41) | KMT2AGAAPKMALDH1A1HSD11B1 | |
| SCHEMBL36178 | 0.87 | CA2 (0.36) | CES1ALDH1A1CA1CA2CA9 | |
| SCHEMBL1804139 | 0.86 | GAA (0.35) | KMT2AGAACA4LTA4HHTT | |
| SCHEMBL1800748 | 0.85 | CA1 (0.34) | KMT2AGAACA4LTA4HHTT | |
| SCHEMBL64775 | 0.85 | PPARA (0.32) | KMT2A | |
| SCHEMBL503265 | 0.82 | PKM (0.34) | KMT2AGAAPKMALDH1A1HSD11B1 | |
| SCHEMBL7574614 | 0.82 | CA4 (0.43) | CA4LTA4HHTTPKMPPARG | |
| SCHEMBL1270050 | 0.81 | HSD11B1 (0.39) | KMT2AALDH1A1HSD11B1CA1CA2 | |
| SCHEMBL7582840 | 0.79 | HTT (0.43) | CA4LTA4HHTTPKMPPARG | |
| SCHEMBL4655792 | 0.79 | HTT (0.45) | GAACA4LTA4HHTTPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 642 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2031007-A2 | Norbornene-type polymers, compositions thereof and lithographic processes using such compositions | Promerus LLC (US) | 2009-03-04 | — | — | EP | claimed |
| EP-1853972-A2 | NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS | Promerus LLC (US) | 2007-11-14 | — | — | EP | claimed |
| US-20060234164-A1 | copolymerizing norbornene monomers containing ester groups, sulonamide groups, ethers, alcohols in presence of (Acetonitrile) bis(triisopropylphosphine)palladium(acetate) tetrakis (pentafluorophenyl)borate catalyst and an optional cocatalyst lithium tetrakis(pentafluorophenyl)borate diethyl etherate | PROMERUS LLC (US) | 2006-10-19 | — | — | US | claimed |
| WO-2006091802-A2 | NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS | PROMERUS LLC (US) | 2006-08-31 | — | — | WO | claimed |
| WO-2006091523-A2 | NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS | PROMERUS LLC (US) | 2006-08-31 | — | — | WO | claimed |
| US-6664021-B1 | Acid generator and silicon-containing polyimide ester precursor comprising partially esterified silicon-containing polyamic ester; radiating with light | CHISSO CORPORATION (JP) | 2003-12-16 | — | — | US | claimed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | claimed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | claimed |
| EP-0249139-B2 | Resist compositions and use | MICROSI INC (US) | 1998-03-11 | — | — | EP | claimed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | claimed |
| EP-0284868-B1 | Photoresist compositions | MICROSI INC (US) | 1995-05-03 | — | — | EP | claimed |
| EP-0284868-A2 | Photoresist compositions | MicroSi, Inc. (a Delaware corporation) (US) | 1988-10-05 | — | — | EP | claimed |
| EP-0249139-A2 | Resist compositions and use | MicroSi, Inc. (a Delaware corporation) (US) | 1987-12-16 | — | — | EP | claimed |
| WO-2026097702-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR PREPARING PATTERN, CURED PRODUCT, AND ELECTRONIC COMPONENT | 江苏艾森半导体材料股份有限公司 | 2026-05-15 | — | — | WO | disclosed |
| US-20260132316-A1 | ULTRAVIOLET DETACHABLE ADHESIVE COMPOSITION, ADHESIVE FILM PREPARED USING SAME, AND METHOD FOR PEELING OFF ADHESIVE FILM | SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION (KR) | 2026-05-14 | — | — | US | disclosed |
| EP-4726005-A1 | ULTRAVIOLET DETACHABLE ADHESIVE COMPOSITION, ADHESIVE FILM PREPARED USING SAME, AND METHOD FOR PEELING OFF ADHESIVE FILM | Seoul National University R&DB Foundation (KR) | 2026-04-15 | — | — | EP | disclosed |
| US-5362607-A | Photo-patternable in absence of moisture; treating substrate with positive resist composition, baking, irradiating resist in patterned way, heating, developing; resist of water-soluble phenolic resin, tertiary butyl compound, aryl onium salt | MICROSI, INC. (US) | 1994-11-08 | — | — | US | disclosed |
| US-5310619-A | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable | MICROSI, INC. (US) | 1994-05-10 | — | — | US | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |
| EP-0249139-A2 | Resist compositions and use | MicroSi, Inc. (a Delaware corporation) (US) | 1987-12-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260132316-A1 | ULTRAVIOLET DETACHABLE ADHESIVE COMPOSITION, ADHESIVE FILM PREPARED USING SAME, AND METHOD FOR PEELING OFF ADHESIVE FILM | CDH1, ICAM1, RAD51 | KMT2A 1880/4885GAA 4590/4885CA4 3767/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.