SCHEMBL5486703

SCHEMBL5486703

Clc1ccccc1C[Si](Cl)(Cl)Cl

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 3/20 0.52
PNMT P11086 1/20 0.52
TAAR1 Q96RJ0 3/20 0.48
KMT2A Q03164 1/20 0.44
PKM P14618 1/20 0.43
TSHR P16473 2/20 0.43
LMNA P02545 1/20 0.43
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
CHRM2 P08172 1/20 0.42
SLC6A2 P23975 1/20 0.41
SLC6A4 P31645 1/20 0.41
SLC6A3 Q01959 1/20 0.41
AOC3 Q16853 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
KCNH2 Q12809 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5486729 0.78 ALDH1A1 (0.43) IDO1PNMTTAAR1LMNASLC6A2
SCHEMBL5487166 0.76 TAAR1 (0.56) IDO1PNMTTAAR1KMT2APKM
SCHEMBL7942042 0.75 ALDH1A1 (0.39) IDO1PNMTKMT2ATSHR
SCHEMBL7609506 0.73 TAAR1 (0.46) IDO1TAAR1KMT2ATSHRLMNA
SCHEMBL5081674 0.73 TAAR1 (0.46) IDO1PNMTTAAR1CYP1A2CYP2D6
SCHEMBL1066724 0.73 TAAR1 (0.46) TAAR1KMT2ATSHRLMNANPC1
SCHEMBL8760758 0.73 IDO1 (0.45) IDO1PNMTTAAR1KMT2APKM
SCHEMBL672407 0.73 IDO1 (0.62) IDO1PNMTTAAR1PKMTSHR
SCHEMBL6740216 0.73 TAAR1 (0.71) IDO1PNMTTAAR1KMT2APKM
SCHEMBL29519238 0.73 IDO1 (0.62) IDO1PNMTTAAR1PKMTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7291747-B2 Silicon compounds and process for preparation thereof CHISSO CORPORATION (JP) 2007-11-06 US disclosed
US-20040143081-A1 Novel silicon compounds and process for preparation thereof JNC CORPORATION (JP) 2004-07-22 US disclosed