SCHEMBL5488956

SCHEMBL5488956

C=C[Si]1(C=C)CCC(C)(C)C(c2ccccc2)(c2ccccc2)O1

nearest known ligand 0.36

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 2/20 0.31
OPRK1 P41145 1/20 0.31
OPRL1 P41146 1/20 0.31
DRD4 P21917 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27605394 0.83 OPRM1 (0.30) OPRM1OPRK1OPRL1
SCHEMBL2369730 0.78 OPRM1 (0.31) OPRM1OPRK1OPRL1
SCHEMBL2232615 0.74 OPRM1 (0.35) OPRM1OPRK1OPRL1DRD4
SCHEMBL3512868 0.74
SCHEMBL17937891 0.74
SCHEMBL5367983 0.69
SCHEMBL2541392 0.67
SCHEMBL5488952 0.66 OPRM1 (0.31) OPRM1OPRK1OPRL1
SCHEMBL8733746 0.65 HSD11B1 (0.33) OPRM1OPRK1OPRL1
SCHEMBL11700256 0.62 OPRM1 (0.31) OPRM1OPRK1OPRL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100524647-C Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film NIPPON ELECTRIC CO (JP) 2009-08-05 CN disclosed
US-7270849-B2 Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film NEC CORPORATION (JP) 2007-09-18 US disclosed
US-20070157884-A1 ORGANOSILOXANE COPOLYMER FILM, PRODUCTION METHOD AND DEPOSITION APPARATUS FOR SAID COPOLYMER FILM, AND SEMICONDUCTOR DEVICE USING SAID COPOLYMER FILM NEC CORPORATION (JP) 2007-07-12 US disclosed
US-20050267253-A1 Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film GODO KAISHA IP BRIDGE 1 (JP) 2005-12-01 US disclosed
CN-1682356-A Organic siloxane copolymer film, method and deposition apparatus for producing same, and semiconductor device using such copolymer film NIPPON ELECTRIC CO (JP) 2005-10-12 CN disclosed