SCHEMBL5568841

SCHEMBL5568841

O=CNc1cccc2cc3ccccc3cc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.50
KDM4E B2RXH2 4/20 0.50
GAA P10253 3/20 0.50
MEN1 O00255 3/20 0.50
KMT2A Q03164 3/20 0.50
MAPT P10636 2/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
PABPC1 P11940 1/20 0.47
TSHR P16473 2/20 0.44
HDAC1 Q13547 1/20 0.43
HDAC7 Q8WUI4 1/20 0.43
HDAC8 Q9BY41 1/20 0.43
HDAC6 Q9UBN7 1/20 0.43
CYP1A2 P05177 2/20 0.36
MITF O75030 1/20 0.36
CYP2C9 P11712 1/20 0.36
PKM P14618 1/20 0.36
MAPK1 P28482 1/20 0.36
RAB9A P51151 1/20 0.36
CCR6 P51684 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29506422 0.86 PABPC1 (0.52) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL15453251 0.86 PABPC1 (0.52) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL87813 0.82 PABPC1 (0.56) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL798498 0.80 PABPC1 (0.40) ALDH1A1KDM4EGAAMEN1KMT2A
Hydrochloric Acid SCHEMBL28740125 0.80 PABPC1 (0.55) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL28218656 0.80 PABPC1 (0.55) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL27860753 0.79 KMT2A (0.50) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL28124446 0.78 PABPC1 (0.41) ALDH1A1PABPC1TSHRHSD17B10TRPV1
SCHEMBL31346513 0.77 ALDH1A1 (0.58) ALDH1A1KDM4EGAAMEN1KMT2A
SCHEMBL3972303 0.77 ALDH1A1 (0.58) ALDH1A1KDM4EGAAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110753881-B Alkali-developable photosensitive resin composition, dry film, cured product, and printed wiring board 太阳控股株式会社 2024-06-21 CN disclosed
WO-2023132214-A1 CURABLE COMPOSITION AND CURED PRODUCT 株式会社カネカ 2023-07-13 WO disclosed
CN-113543897-B Method for producing polarizing film 日东电工株式会社 2023-04-18 CN disclosed
CN-115867836-A Polarizing film, optical film and image display device 日东电工株式会社 2023-03-28 CN disclosed
CN-114930211-A Method for producing polarizing film 日东电工株式会社 2022-08-19 CN disclosed
CN-114561172-A Adhesive composition for polarizing film, optical film, and image display device 日东电工株式会社 2022-05-31 CN disclosed
CN-110651336-B Conductive paste composition, electrode device comprising same, and method for producing conductive paste composition 株式会社钟化 2022-05-17 CN disclosed
WO-2022071387-A1 POLARIZING FILM, OPTICAL FILM, AND IMAGE DISPLAY DEVICE 日東電工株式会社 2022-04-07 WO disclosed
CN-110168035-B Adhesive composition for polarizing film, optical film, and image display device 日东电工株式会社 2022-03-11 CN disclosed
CN-110268291-B Curable resin composition for polarizing film, and method for producing same 日东电工株式会社 2022-03-08 CN disclosed
CN-104281005-A Curable resin composition, cured product thereof, printed circuit board comprising the same, and method for producing the cured product TAIYO INK MFG CO LTD 2015-01-14 CN disclosed
US-20150010735-A1 CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, PRINTED CIRCUIT BOARD COMPRISING THE SAME, AND METHOD FOR PRODUCING THE CURED PRODUCT TAIYO INK MFG. CO., LTD. (JP) 2015-01-08 US disclosed
US-20140034371-A1 PATTERN FORMING METHOD, ALKALI-DEVELOPABLE THERMOSETTING RESIN COMPOSITION, PRINTED CIRCUIT BOARD AND MANUFACTURING METHOD THEREOF TAIYO INK MFG. CO., LTD. (JP) 2014-02-06 US disclosed
US-8115027-B2 NPY Y5 antagonist SHIONOGI & CO., LTD. (JP) 2012-02-14 US disclosed
US-20110039802-A1 NPY Y5 ANTAGONIST KAWANISHI YASUYUKI 2011-02-17 US disclosed
US-20100292500-A1 NPY Y5 ANTAGONIST KAWANISHI YASUYUKI 2010-11-18 US disclosed
US-7781461-B2 NPY Y5 antagonist KAWANISHI YASUYUKI 2010-08-24 US disclosed
US-7265130-B2 NPY Y5 antagonist SHIONOGI & CO., LTD. (JP) 2007-09-04 US disclosed
US-7202246-B2 Spiro-rifamycin derivatives targeting RNA polymerase CUMBRE PHARMACEUTICALS INC. (US) 2007-04-10 US disclosed
US-20050277633-A1 E.g., rifamycin S derivatives such as 2',2'-Dimethyl-3,4-piperazinorifamycin S and Spiro[N-methyl-piperidine-3,4-piperazinorifamycin S; treating bacterial infections, especially those caused by rifamycin-resistant bacteria CUMBRE INC. (US) 2005-12-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100292500-A1 NPY Y5 ANTAGONIST NPY5R, NPY1R, NPY2R ALDH1A1 4599/4885KDM4E 1627/4885GAA 3316/4885
US-20050277633-A1 E.g., rifamycin S derivatives such as 2',2'-Dimethyl-3,4-piperazinorifamycin S and Spiro[N-methyl-piperidine-3,4-piperazinorifamycin S; treating bacterial infections, especially those caused by rifamycin-resistant bacteria RIF1, MAPRE1, MAPRE2 ALDH1A1 1322/4885KDM4E 402/4885GAA 1432/4885
US-20110039802-A1 NPY Y5 ANTAGONIST NPY5R, NPY1R, NPY2R ALDH1A1 4517/4885KDM4E 1653/4885GAA 3472/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.