SCHEMBL559259

SCHEMBL559259

CCO[Si](OCC)(OCC)C(CC)OC(C)=O

nearest known ligand 0.36

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.36
ALDH1A1 P00352 2/20 0.36
LMNA P02545 1/20 0.36
HSD17B10 Q99714 1/20 0.36
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
CHRM1 P11229 1/20 0.32
TBXA2R P21731 1/20 0.32
GALR3 O60755 1/20 0.31
MAPT P10636 1/20 0.31
BLM P54132 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28489600 0.90 ALDH1A1 (0.32) TSHRALDH1A1LMNAHSD17B10
SCHEMBL8839126 0.84 TSHR (0.33) TSHRALDH1A1CHRM2CHRM4CHRM1
SCHEMBL4007769 0.83
Ammonia Solution, Strong SCHEMBL9998827 0.83 ALDH1A1 (0.32) ALDH1A1
SCHEMBL8839122 0.82 MEN1 (0.33)
SCHEMBL9323704 0.82 MGAM (0.38)
SCHEMBL176415 0.82 LMNA (0.33) TSHRALDH1A1LMNAMAPT
SCHEMBL5186800 0.82 ALOX15 (0.38) TSHRLMNACHRM2CHRM4CHRM1
SCHEMBL3344601 0.82 TSHR (0.34) TSHRALDH1A1LMNAHSD17B10CHRM2
SCHEMBL29169354 0.81 ALDH1A1 (0.31) TSHRALDH1A1LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2580294-B1 PVDF COATING COMPOSITIONS SOLVAY SOLEXIS SPA (IT) 2015-02-25 EP claimed
EP-2580294-A1 PVDF COATING COMPOSITIONS Solvay Solexis S.p.A. (IT) 2013-04-17 EP claimed
US-20130090417-A1 PVDF coating compositions SOLVAY SPECIALTY POLYMERS ITALY S.P.A. (IT) 2013-04-11 US claimed
WO-2011157657-A1 PVDF COATING COMPOSITIONS SOLVAY SOLEXIS S.P.A. (IT) 2011-12-22 WO claimed
US-12248251-B2 Silicon-containing resist underlayer film-forming composition including organic group having ammonium group NISSAN CHEMICAL CORPORATION (JP) 2025-03-11 US disclosed
EP-4458916-A1 PHOTOCATALYTICALLY ACTIVE COATING COMPOSITION, METHOD FOR THE PRODUCTION THEREOF AND USE THEREOF TriOptoTec GmbH (DE) 2024-11-06 EP disclosed
US-11966164-B2 Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group NISSAN CHEMICAL CORPORATION (JP) 2024-04-23 US disclosed
CN-110809739-B Composition for forming silicon-containing resist underlayer film soluble in alkaline developer 日产化学株式会社 2023-11-21 CN disclosed
US-11815815-B2 Composition for forming silicon-containing resist underlayer film removable by wet process NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-11-14 US disclosed
US-20220373888-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ORGANIC GROUP HAVING AMMONIUM GROUP NISSAN CHEMICAL CORPORATION (JP) 2022-11-24 US disclosed
US-20220155688-A1 ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2022-05-19 US disclosed
US-11281104-B2 Alkaline developer soluable silicon-containing resist underlayer film-forming composition NISSAN CHEMICAL CORPORATION (JP) 2022-03-22 US disclosed
US-6410675-B2 Functionalized silicon compounds and methods for their synthesis and use AFFYMETRIX, INC. 2002-06-25 US disclosed
US-20010027187-A1 Functionalized silicon compounds and methods for their synthesis and use AFFYMETRIX, INC. 2001-10-04 US disclosed
US-20010021506-A1 Functionalized silicon compounds and methods for their synthesis and use AFFYMETRIX, INC. 2001-09-13 US disclosed
US-20010014453-A1 Functionalized silicon compounds and methods for their synthesis and use AFFYMETRIX, INC. 2001-08-16 US disclosed
US-6262216-B1 USED TO FORM A FUNCTIONALIZED COATING ON SUBSTRATE; ARRAY OF NUCLEIC ACIDS MAY BE COVALENTLY ATTACHED TO SUBSTRATE TO MAKE HIGH DENSITY ARRAYS TO NUCLEIC ACIDS IMMOBILIZED ON SUBSTRATE WHICH MAY BE USED IN HIGH VOLUME NUCLEIC ACID HYBRIDIZATION AFFYMETRIX, INC. 2001-07-17 US disclosed
WO-2000061282-A1 POROUS SILICA SUBSTRATES FOR POLYMERS SYNTHESIS AND ASSAYS AFFYMETRIX, INC. (US) 2000-10-19 WO disclosed
WO-2000021967-A1 FUNCTIONALIZED SILICON COMPOUNDS, THEIR SYNTHESIS AND USE AFFYMETRIX, INC. (US) 2000-04-20 WO disclosed
US-5679821-A Process for preparing organosilicon compound TOAGOSEI CO., LTD. (JP) 1997-10-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20010027187-A1 Functionalized silicon compounds and methods for their synthesis and use SRRT, DNMT1, SIK1 TSHR 2887/4885ALDH1A1 1479/4885LMNA 1633/4885
US-20010021506-A1 Functionalized silicon compounds and methods for their synthesis and use SRRT, DNMT1, SIK1 TSHR 2887/4885ALDH1A1 1479/4885LMNA 1633/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.