Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.31 |
| ▸ | GALR3 | O60755 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | BLM | P54132 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8628389 | 0.83 | TSHR (0.37) | TSHRALDH1A1LMNAHSD17B10CHRM2 | |
| SCHEMBL1551132 | 0.82 | THRB (0.37) | TSHRALDH1A1 | |
| SCHEMBL559259 | 0.82 | TSHR (0.36) | TSHRALDH1A1LMNAHSD17B10CHRM2 | |
| SCHEMBL28529148 | 0.82 | TSHR (0.36) | TSHRALDH1A1LMNAHSD17B10CHRM2 | |
| SCHEMBL139100 | 0.78 | TSHR (0.35) | TSHRALDH1A1SMN1; SMN2 | |
| SCHEMBL3338084 | 0.78 | TSHR (0.41) | TSHRALDH1A1LMNAHSD17B10CHRM2 | |
| SCHEMBL28489600 | 0.77 | ALDH1A1 (0.32) | TSHRALDH1A1LMNAHSD17B10 | |
| SCHEMBL15091383 | 0.75 | TSHR (0.37) | TSHRALDH1A1LMNAHSD17B10CHRM2 | |
| SCHEMBL10889597 | 0.75 | TSHR (0.37) | TSHRALDH1A1LMNAHSD17B10CHRM2 | |
| SCHEMBL8968296 | 0.75 | TSHR (0.37) | TSHRALDH1A1LMNAHSD17B10CHRM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |
| US-5679821-A | Process for preparing organosilicon compound | TOAGOSEI CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |