Potassium Ion

Potassium Ion

SCHEMBL5597232

CCCCCCCCCCCCCCC/C=C/C(CC(=O)[O-])C(=O)[O-].[K+].[K+]

nearest known ligand 0.56

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
FABP3 P05413 7/20 0.56
SLC6A5 Q9Y345 1/20 0.45
EPHX2 P34913 1/20 0.44
FAAH O00519 1/20 0.42
MEN1 O00255 1/20 0.42
CYP3A4 P08684 1/20 0.42
KMT2A Q03164 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL8669137 1.00 FABP3 (0.56) FABP3SLC6A5EPHX2FAAHMEN1
Potassium Ion SCHEMBL5597233 1.00 FABP3 (0.56) FABP3SLC6A5EPHX2FAAHMEN1
Potassium Ion SCHEMBL5597298 1.00 FABP3 (0.56) FABP3SLC6A5EPHX2FAAHMEN1
Potassium Ion SCHEMBL1534741 1.00 FABP3 (0.56) FABP3SLC6A5EPHX2FAAHMEN1
Potassium Ion SCHEMBL5597299 1.00 FABP3 (0.56) FABP3SLC6A5EPHX2FAAHMEN1
Potassium Ion SCHEMBL5690557 1.00 FABP3 (0.56) FABP3SLC6A5EPHX2FAAHMEN1
Potassium Ion SCHEMBL2139388 1.00 FABP3 (0.56) FABP3SLC6A5EPHX2FAAHMEN1
Potassium Ion SCHEMBL1534743 1.00 FABP3 (0.56) FABP3SLC6A5EPHX2FAAHMEN1
Potassium Ion SCHEMBL8669136 1.00 FABP3 (0.56) FABP3SLC6A5EPHX2FAAHMEN1
Potassium Ion SCHEMBL5690504 1.00 FABP3 (0.56) FABP3SLC6A5EPHX2FAAHMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117120538-A Thermoplastic resin composition and molded article thereof 大科能宇菱通株式会社 2023-11-24 CN disclosed
CN-117083343-A Thermoplastic resin composition and molded article 大科能宇菱通株式会社 2023-11-17 CN disclosed
CN-110945073-B Thermoplastic resin composition for plating, resin molded article, and plated article 大科能宇菱通株式会社 2020-07-10 CN disclosed
CN-110945073-A Thermoplastic resin composition for plating, resin molded article, and plated article 大科能宇菱通株式会社 2020-03-31 CN disclosed
EP-2957580-B1 GRAFT COPOLYMER, THERMOPLASTIC RESIN COMPOSITION, AND MOULDED ARTICLE OF SAID RESIN COMPOSITION UMG ABS LTD (JP) 2019-06-19 EP disclosed
US-9657169-B2 Graft copolymer, thermoplastic resin composition, and molded article of said resin composition UMG ABS, LTD. (JP) 2017-05-23 US disclosed
US-20150376395-A1 GRAFT COPOLYMER, THERMOPLASTIC RESIN COMPOSITION, AND MOLDED ARTICLE OF SAID RESIN COMPOSITION UMG ABS, LTD. (JP) 2015-12-31 US disclosed
EP-2957580-A1 GRAFT COPOLYMER, THERMOPLASTIC RESIN COMPOSITION, AND MOULDED ARTICLE OF SAID RESIN COMPOSITION UMG ABS, Ltd. (JP) 2015-12-23 EP disclosed
EP-1245597-B1 GRAFT COPOLYMER AND THERMOPLASTIC RESIN COMPOSITION CONTAINING THE SAME MITSUBISHI RAYON CO (JP) 2007-03-21 EP disclosed
US-6777492-B1 GAS EVOLUTION DURING THE MOLDING IS REMARKABLY PREVENTED MITSUBISHI RAYON CO., LTD. (JP) 2004-08-17 US disclosed
EP-1245597-A1 GRAFT COPOLYMER AND THERMOPLASTIC RESIN COMPOSITION CONTAINING THE SAME Mitsubishi Rayon Co., Ltd. (JP) 2002-10-02 EP disclosed