Diphenylether

Diphenylether

SCHEMBL5606885

O=C(O)O.O=C(O)O.O=C(O)O.O=C(O)O.c1ccc(Oc2ccccc2)cc1

nearest known ligand 0.75

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Diphenylether. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 4/20 0.75
TSHR P16473 1/20 0.75
PARP10 Q53GL7 1/20 0.62
NR1H2 P55055 1/20 0.62
BAX Q07812 1/20 0.62
SRD5A2 P31213 3/20 0.60
AKR1C3 P42330 1/20 0.60
FFAR1 O14842 1/20 0.56
MAOA P21397 1/20 0.55
CA1 P00915 1/20 0.54
CA2 P00918 1/20 0.54
HPGD P15428 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
PGR P06401 1/20 0.54
CTNNB1 P35222 1/20 0.52
ERCC5 P28715 1/20 0.52
FEN1 P39748 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Diphenylether SCHEMBL1965337 1.00 LTA4H (0.75) LTA4HTSHRPARP10NR1H2BAX
Diphenylether SCHEMBL360280 1.00 LTA4H (0.75) LTA4HTSHRPARP10NR1H2BAX
Diphenylether SCHEMBL7033901 0.89 LTA4H (0.60) LTA4HTSHRPARP10NR1H2BAX
Diphenylether SCHEMBL9846088 0.89 LTA4H (0.60) LTA4HTSHRPARP10NR1H2BAX
Diphenylether SCHEMBL10618785 0.88 PARP10 (0.71) LTA4HTSHRPARP10NR1H2BAX
Diphenylether SCHEMBL29175285 0.88 LTA4H (0.67) LTA4HTSHRPARP10NR1H2BAX
Diphenylether SCHEMBL1830446 0.88 LTA4H (0.67) LTA4HTSHRPARP10NR1H2BAX
Diphenylether SCHEMBL7637273 0.88 LTA4H (0.67) LTA4HTSHRPARP10NR1H2BAX
Diphenylether SCHEMBL28412058 0.88 LTA4H (0.67) LTA4HTSHRPARP10NR1H2BAX
Diphenylether SCHEMBL8165466 0.88 PARP10 (0.71) LTA4HTSHRPARP10NR1H2BAX

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2832768-B1 PREPARATION METHOD OF POLYIMIDE CHANGCHUN HIPOLYKING CO LTD (CN) 2017-07-05 EP claimed
EP-1123348-B1 IMPACT-RESISTANT EPOXIDE RESIN COMPOSITIONS HENKEL TEROSON GMBH (DE) 2005-12-28 EP claimed
EP-1272587-B1 IMPACT-RESISTANT EPOXY RESIN COMPOSITIONS HENKEL KGAA (DE) 2004-05-19 EP claimed
EP-0962459-B1 DIACETAL COMPOSITION, PROCESS FOR THE PREPARATION OF THE SAME, NUCLEATING AGENT FOR POLYOLEFINS CONTAINING THE SAME, POLYOLEFIN RESIN COMPOSITIONS, AND MOLDINGS NEW JAPAN CHEM CO LTD (JP) 2003-10-01 EP claimed
EP-1272587-A1 IMPACT-RESISTANT EPOXY RESIN COMPOSITIONS Henkel Kommanditgesellschaft auf Aktien (DE) 2003-01-08 EP claimed
WO-2001094492-A1 IMPACT-RESISTANT EPOXY RESIN COMPOSITIONS HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2001-12-13 WO claimed
EP-1123348-A2 IMPACT-RESISTANT EPOXIDE RESIN COMPOSITIONS Henkel Teroson GmbH (DE) 2001-08-16 EP claimed
WO-2000020483-A2 IMPACT-RESISTANT EPOXIDE RESIN COMPOSITIONS HENKEL TEROSON GMBH (DE) 2000-04-13 WO claimed
EP-0701996-A1 Process for the separation of aminodiphenyl from diphenylamine BAYER AG (DE) 1996-03-20 EP claimed
EP-2231327-B1 CATALYST COMPOSITION INCLUDING ZIRCONIUM COMPOUNDS FOR ESTERFICATION REACTION AND METHOD FOR PREPARING ESTER COMPOUNDS LG CHEMICAL LTD (KR) 2013-10-16 EP disclosed
CN-1834048-B Synthetic silicates and use thereof in glass production MINERALS TECH INC 2010-10-20 CN disclosed
EP-1456321-B1 MULTI-PHASE STRUCTURAL ADHESIVES HENKEL KGAA (DE) 2007-04-18 EP disclosed
CN-1281545-C Synthetic silicates and their use in glass production MINERALS TECH INC (US) 2006-10-25 CN disclosed
CN-1834048-A Method of producing synthetic silicates and use thereof in glass production MINERALS TECH INC (US) 2006-09-20 CN disclosed
EP-1272587-A1 IMPACT-RESISTANT EPOXY RESIN COMPOSITIONS Henkel Kommanditgesellschaft auf Aktien (DE) 2003-01-08 EP disclosed
WO-2001094492-A1 IMPACT-RESISTANT EPOXY RESIN COMPOSITIONS HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2001-12-13 WO disclosed
EP-1123348-A2 IMPACT-RESISTANT EPOXIDE RESIN COMPOSITIONS Henkel Teroson GmbH (DE) 2001-08-16 EP disclosed
CN-1283170-A Synthetic silicates and their use in glass production MINERALS TECH INC (US) 2001-02-07 CN disclosed
WO-2000020483-A2 IMPACT-RESISTANT EPOXIDE RESIN COMPOSITIONS HENKEL TEROSON GMBH (DE) 2000-04-13 WO disclosed
EP-0701996-A1 Process for the separation of aminodiphenyl from diphenylamine BAYER AG (DE) 1996-03-20 EP disclosed