SCHEMBL5607929

SCHEMBL5607929

CC(=O)OCC12CC3CC(CC(O)(C3)C1)C2

nearest known ligand 0.51

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.44
THRB P10828 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
SCN9A Q15858 2/20 0.41
GAA P10253 1/20 0.40
HSD11B1 P28845 1/20 0.38
PKM P14618 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA9 Q16790 1/20 0.38
MAPT P10636 1/20 0.37
HPGD P15428 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL76909 0.84 ALDH1A1 (0.40) ALDH1A1THRBMEN1KMT2AL3MBTL1
SCHEMBL12017107 0.84 ALDH1A1 (0.47) ALDH1A1THRBMEN1KMT2AL3MBTL1
SCHEMBL5608620 0.84 ALDH1A1 (0.45) ALDH1A1THRBMEN1KMT2AL3MBTL1
SCHEMBL12093414 0.83 ALDH1A1 (0.44) ALDH1A1THRBMEN1KMT2AL3MBTL1
SCHEMBL12093412 0.83 ALDH1A1 (0.47) ALDH1A1THRBMEN1KMT2AL3MBTL1
SCHEMBL686001 0.83 ALDH1A1 (0.41) ALDH1A1THRBMEN1KMT2AL3MBTL1
SCHEMBL12406395 0.82 ALDH1A1 (0.61) ALDH1A1MEN1KMT2AL3MBTL1CA12
SCHEMBL12705106 0.81 ALDH1A1 (0.40) ALDH1A1THRBMEN1KMT2AL3MBTL1
SCHEMBL17547627 0.81 ALDH1A1 (0.42) ALDH1A1THRBMEN1KMT2AL3MBTL1
SCHEMBL21467411 0.81 ALDH1A1 (0.60) ALDH1A1THRBMEN1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230266666-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-24 US disclosed
US-10377692-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-08-13 US disclosed
US-9921474-B2 Pattern-forming method and composition JSR CORPORATION (JP) 2018-03-20 US disclosed
US-20160291462-A1 PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT JSR CORPORATION (JP) 2016-10-06 US disclosed
US-20150253670-A1 PATTERN-FORMING METHOD AND COMPOSITION JSR CORPORATION (JP) 2015-09-10 US disclosed
US-8852846-B2 Salt and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-10-07 US disclosed
US-20120258403-A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-10-11 US disclosed
US-20110065047-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110059400-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-10 US disclosed
US-RE39744-E1 Adamantane derivatives and process for producing them DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-07-24 US disclosed
US-6392104-B1 CHEMICAL INTERMEDIATES FOR DRUGS, AGRICULTURE DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2002-05-21 US disclosed
EP-0927711-A1 ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THEM Daicel Chemical Industries, Ltd. (JP) 1999-07-07 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110059400-A1 PHOTORESIST COMPOSITION C1R, C1S, CCNT1 ALDH1A1 2162/4885THRB 3732/4885MEN1 1989/4885
US-20110065047-A1 PHOTORESIST COMPOSITION C1R, C1S, RER1 ALDH1A1 1016/4885THRB 4469/4885MEN1 1119/4885
US-20120258403-A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME CLIC4, CLIC1, SLC26A3 ALDH1A1 3994/4885THRB 3272/4885MEN1 1678/4885
US-20230266666-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-0, H1-4, CHRM1 ALDH1A1 1862/4885THRB 2899/4885MEN1 1123/4885
US-10377692-B2 Photoresist composition C1R, C1S, F12 ALDH1A1 2217/4885THRB 3478/4885MEN1 2101/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.