SCHEMBL5653717

SCHEMBL5653717

CCCCC(F)(F)C(F)F

nearest known ligand 0.32

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CES2 O00748 4/20 0.32
LPAR1 Q92633 1/20 0.32
LPAR3 Q9UBY5 1/20 0.32
TSHR P16473 2/20 0.32
LMNA P02545 1/20 0.32
FAAH O00519 8/20 0.31
CES1 P23141 5/20 0.30
THRB P10828 1/20 0.30
MEN1 O00255 1/20 0.30
CYP1A2 P05177 1/20 0.30
KMT2A Q03164 1/20 0.30
HSD17B10 Q99714 1/20 0.30
FDPS P14324 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16144914 1.00 CES2 (0.32) CES2LPAR1LPAR3TSHRLMNA
SCHEMBL4077275 0.90 CES2 (0.43) CES2LPAR1LPAR3TSHRFAAH
SCHEMBL13717051 0.90 CES2 (0.43) CES2LPAR1LPAR3TSHRFAAH
SCHEMBL256676 0.82
SCHEMBL26064066 0.81 CES2 (0.31) CES2LPAR1LPAR3TSHRLMNA
SCHEMBL27280076 0.79 FDPS (0.32) CES2LPAR1LPAR3FDPS
SCHEMBL21938390 0.78 CES2 (0.32) CES2LPAR1LPAR3TSHRLMNA
SCHEMBL15081202 0.75
SCHEMBL15402658 0.74
SCHEMBL440297 0.74 CES2 (0.30) CES2LPAR1LPAR3TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103695129-A Working fluid comprising polyol ester lubricant CHEMTURA CORP 2014-04-02 CN claimed
US-20230280651-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-07 US disclosed
US-11693314-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US disclosed
CN-101367938-A Novel fluorine-containing polyamide sulfonylamine polymer and preparation method thereof YONGMING ZHANG (CN) 2009-02-18 CN disclosed
US-7217492-B2 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2007-05-15 US disclosed
US-20050053861-A1 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2005-03-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230280651-A1 RESIST COMPOSITION AND PATTERNING PROCESS EIF2B1, EIF2B5, EIF2B3 CES2 2818/4885LPAR1 896/4885LPAR3 1294/4885
US-11693314-B2 Resist composition and patterning process EIF2B1, EIF2B5, EIF2B3 CES2 2818/4885LPAR1 896/4885LPAR3 1294/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.