Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CD81 | P60033 | 2/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | APLNR | P35414 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1592699 | 1.00 | CD81 (0.34) | CD81HSD11B1TSHRAPLNR | |
| SCHEMBL31239207 | 0.83 | CYP17A1 (0.32) | — | |
| SCHEMBL2221258 | 0.79 | HSD11B1 (0.33) | HSD11B1APLNR | |
| SCHEMBL564565 | 0.77 | HSD11B1 (0.34) | CD81HSD11B1 | |
| SCHEMBL565407 | 0.77 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL2680774 | 0.77 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL8595506 | 0.77 | THRB (0.34) | CD81APLNR | |
| SCHEMBL1397128 | 0.77 | HSD11B1 (0.34) | CD81HSD11B1 | |
| SCHEMBL13835602 | 0.75 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL8959201 | 0.75 | THRB (0.33) | CD81APLNR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 254 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230374324-A1 | A Quantum Dot Ink, a Color Filter Film, a Display Device and a Color Filter Film Preparation Method | Suzhou Xingshuo Nanotech Co., Ltd. (CN) | 2023-11-23 | — | — | US | claimed |
| EP-1811339-B1 | Pattern forming method | FUJIFILM CORP (JP) | 2021-03-17 | — | — | EP | claimed |
| US-20110177454-A1 | RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL | PANASONIC CORPORATION (JP) | 2011-07-21 | — | — | US | claimed |
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | claimed |
| US-20080051597-A1 | Process for Producing 2-Methyladamantan-2-Yl (Meth)Acrylate and 2-Methyladamantan-2-Yl (Meth)Acrylate | MITSUBISHI CHEMICAL CORPORATION (JP) | 2008-02-28 | — | — | US | claimed |
| US-7014980-B2 | Includes a polymer containing at least one of the following monomers: 1,1,1-trifluoro-2-trifluoromethyl-2-hydroxy-(4 or 5)-pentyl (meth)acrylate or 2-{[5-(1',1',1'-trifluoro-2'-trifluoromethyl-2'-hydroxy)propyl]norbornyl]}(meth)acrylate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-03-21 | — | — | US | claimed |
| US-20050019696-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-01-27 | — | — | US | claimed |
| EP-1041442-B1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL CO (JP) | 2004-10-27 | — | — | EP | claimed |
| US-6806026-B2 | POLYMER OF A FLUORINATED HYDROXYALKYL ACRYLATE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-10-19 | — | — | US | claimed |
| US-20030224283-A1 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-12-04 | — | — | US | claimed |
| US-20030207200-A1 | Phenolic/alicyclic copolymers and photoresists | SHIPLEY COMPANY, L.L.C. (US) | 2003-11-06 | — | — | US | claimed |
| EP-1091250-A1 | Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | claimed |
| EP-3421541-B1 | POLYOL COMPOSITION AND THERMOSETTING RESIN | KANEKA CORP (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-20230374324-A1 | A Quantum Dot Ink, a Color Filter Film, a Display Device and a Color Filter Film Preparation Method | Suzhou Xingshuo Nanotech Co., Ltd. (CN) | 2023-11-23 | — | — | US | disclosed |
| US-11667742-B2 | Compositions with high refractive index and Abbe number | Johnson & Johnson Surgical Vision, Inc. (US) | 2023-06-06 | — | — | US | disclosed |
| CN-109843853-B | Composition and method for manufacturing device using the same | 东洋合成工业株式会社 | 2022-09-20 | — | — | CN | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-6261738-B1 | LATENT CURING CATALYSTS FOR PHOTORESISTS SUCH AS 2,2,2-TRIFLUORO-1-PHENYL-ETHANONE OXIME-O-METHYL SULFONATE | CIBA SPECIALTY CHEMICALS CORPORATION | 2001-07-17 | — | — | US | disclosed |
| EP-1091250-A1 | Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | disclosed |
| US-5910392-A | ACRYLATE COPOLYMERS | FUJITSU LIMITED (JP) | 1999-06-08 | — | — | US | disclosed |