Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2680774 | 1.00 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL27965584 | 0.82 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL565405 | 0.77 | CD81 (0.34) | HSD11B1 | |
| SCHEMBL1592699 | 0.77 | CD81 (0.34) | HSD11B1 | |
| SCHEMBL5935935 | 0.73 | HSD11B1 (0.32) | HSD11B1 | |
| SCHEMBL701559 | 0.73 | — | — | |
| SCHEMBL1397128 | 0.72 | HSD11B1 (0.34) | HSD11B1 | |
| SCHEMBL564565 | 0.72 | HSD11B1 (0.34) | HSD11B1 | |
| SCHEMBL1999510 | 0.70 | CD81 (0.33) | HSD11B1 | |
| SCHEMBL8595506 | 0.69 | THRB (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | claimed |
| US-20250068077-A1 | CATALYST-FREE CROSSLINKING OF PROPIOLATE-ESTER-FUNCTIONALIZED MOLECULES AND POLYMERS | BREWER SCIENCE, INC. | 2025-02-27 | — | — | US | disclosed |
| EP-4372030-A1 | CURABLE RESIN COMPOSITION | Namics Corporation (JP) | 2024-05-22 | — | — | EP | disclosed |
| EP-4372021-A1 | CURABLE RESIN COMPOSITION | Namics Corporation (JP) | 2024-05-22 | — | — | EP | disclosed |
| WO-2024089906-A1 | RESIN COMPOSITION, ADHESIVE, SEALANT, CURED PRODUCT AND SEMICONDUCTOR DEVICE | NAMICS CORPORATION (JP) | 2024-05-02 | — | — | WO | disclosed |
| WO-2024089905-A1 | RESIN COMPOSITION, ADHESIVE, SEALANT, CURED PRODUCT, SEMICONDUCTOR DEVICE AND ELECTRONIC COMPONENT | NAMICS CORPORATION (JP) | 2024-05-02 | — | — | WO | disclosed |
| US-9594303-B2 | Resist pattern-forming method and photoresist composition | JSR CORPORATION (JP) | 2017-03-14 | — | — | US | disclosed |
| US-9348226-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-05-24 | — | — | US | disclosed |
| US-9296842-B2 | Polymer for lithography | MITSUBISHI RAYON CO., LTD. (JP) | 2016-03-29 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | disclosed |
| US-7704669-B2 | Acrylic polymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2010-04-27 | — | — | US | disclosed |
| US-20070269754-A1 | Acrylic Polymer and Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20060234154-A1 | Mixture containing acid generator and free radical catalyst; acrylated ester monomer | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | disclosed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | disclosed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | disclosed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100221659-A1 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION | AFF1, RER1, AFF4 | HSD11B1 405/4885 |
| US-20250068077-A1 | CATALYST-FREE CROSSLINKING OF PROPIOLATE-ESTER-FUNCTIONALIZED MOLECULES AND POLYMERS | IGLV6-57, PGD, CDV3 | HSD11B1 2040/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.