SCHEMBL5667272

SCHEMBL5667272

O=C(O)c1ccc(C(=O)O)c(-c2ccccc2C#Cc2ccccc2)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.46
RAB9A P51151 1/20 0.46
HNF4A P41235 1/20 0.45
TTR P02766 1/20 0.45
PTPRC P08575 2/20 0.44
KDM4E B2RXH2 2/20 0.44
AKR1C2 P52895 1/20 0.42
AKR1C1 Q04828 1/20 0.42
SLC16A3 O15427 4/20 0.42
KMT2A Q03164 2/20 0.42
POLB P06746 1/20 0.42
FFAR1 O14842 1/20 0.41
SRD5A2 P31213 2/20 0.39
SRD5A1 P18405 1/20 0.39
HSD17B10 Q99714 2/20 0.38
CDC25A P30304 1/20 0.38
CDC25B P30305 1/20 0.38
CYP2C9 P11712 2/20 0.38
PDK2 Q15119 1/20 0.38
MEN1 O00255 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27503029 0.92 FFAR1 (0.46) NPC1RAB9AHNF4ATTRPTPRC
SCHEMBL5666512 0.90 KMO (0.44) NPC1RAB9AHNF4ATTRPTPRC
SCHEMBL5667422 0.88 TTR (0.45) HNF4ATTRPTPRCKDM4EKMT2A
SCHEMBL5666516 0.84 TTR (0.49) NPC1RAB9AHNF4ATTRPTPRC
SCHEMBL7149446 0.84 NPC1 (0.59) NPC1RAB9AHNF4AKDM4EAKR1C2
SCHEMBL1713039 0.83 HNF4A (0.51) NPC1RAB9AHNF4ATTRKDM4E
SCHEMBL5667276 0.82 HNF4A (0.51) HNF4ATTRPTPRCKDM4EAKR1C2
SCHEMBL2746124 0.82 TTR (0.47) TTRPTPRCKDM4EKMT2APOLB
SCHEMBL5667774 0.81 TTR (0.49) NPC1RAB9AHNF4ATTRPTPRC
Hydrochloric Acid SCHEMBL5669827 0.80 TTR (0.47) NPC1RAB9AHNF4ATTRPTPRC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1333050-B1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO (JP) 2006-12-27 EP disclosed
US-7049371-B2 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2006-05-23 US disclosed
US-20040002572-A1 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2004-01-01 US disclosed
EP-1333050-A1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2003-08-06 EP disclosed
EP-1327653-A1 HEAT-RESISTANT RESIN PRECURSOR, HEAT-RESISTANT RESIN AND INSULATING FILM AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2003-07-16 EP disclosed
US-6518390-B2 Polybenzoxazole and crosslinking agent SUMITOMO BAKELITE COMPANY, LTD. (JP) 2003-02-11 US disclosed
US-20020013443-A1 Precursor of a heat resistant resin, heat resistant resin, insulating film and semiconductor device SUMITOMO BAKELITE CO., LTD. (JP) 2002-01-31 US disclosed