SCHEMBL5667707

SCHEMBL5667707

CCCCC#Cc1cc(C(C)(C)c2ccc(C(=O)O)c(C#CCCCC)c2)ccc1C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.41
CYP3A4 P08684 2/20 0.41
KDM4E B2RXH2 1/20 0.41
LMNA P02545 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2D6 P10635 1/20 0.41
MAPT P10636 1/20 0.41
CYP2C9 P11712 1/20 0.41
APEX1 P27695 1/20 0.41
CYP2C19 P33261 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
HSD17B10 Q99714 1/20 0.41
CTSL P07711 1/20 0.37
CTSB P07858 1/20 0.37
PPARA Q07869 2/20 0.36
FFAR1 O14842 1/20 0.36
FFAR4 Q5NUL3 1/20 0.36
CYSLTR2 Q9NS75 1/20 0.36
CYSLTR1 Q9Y271 1/20 0.36
MMP2 P08253 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5669058 0.89 TDP1 (0.41) TDP1CYP3A4KDM4ELMNACYP1A2
SCHEMBL5669154 0.83 RARB (0.45) TDP1CYP3A4KDM4ELMNACYP1A2
SCHEMBL2747816 0.82 ALDH1A1 (0.46) TDP1CYP3A4KDM4ELMNACYP1A2
SCHEMBL19331451 0.77 KDM4E (0.56) TDP1CYP3A4KDM4ELMNACYP1A2
SCHEMBL5669040 0.77 FFAR1 (0.45) FFAR1FFAR4MMP2MMP12TNK2
SCHEMBL22916772 0.76 CYP3A4 (0.37) TDP1CYP3A4KDM4ELMNACYP1A2
SCHEMBL5669496 0.76 CYP3A4 (0.46) TDP1CYP3A4KDM4ELMNACYP1A2
SCHEMBL30305980 0.75 FFAR1 (0.46) TDP1CYP3A4KDM4ELMNACYP1A2
SCHEMBL5669119 0.74 KDM4E (0.44) TDP1CYP3A4KDM4ELMNACYP1A2
SCHEMBL5668907 0.74 HNF4A (0.46) TDP1CYP3A4KDM4ECYP1A2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1333050-B1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO (JP) 2006-12-27 EP disclosed
US-7049371-B2 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2006-05-23 US disclosed
US-20040002572-A1 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2004-01-01 US disclosed
EP-1333050-A1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2003-08-06 EP disclosed
EP-1327653-A1 HEAT-RESISTANT RESIN PRECURSOR, HEAT-RESISTANT RESIN AND INSULATING FILM AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2003-07-16 EP disclosed
US-6518390-B2 Polybenzoxazole and crosslinking agent SUMITOMO BAKELITE COMPANY, LTD. (JP) 2003-02-11 US disclosed
US-20020013443-A1 Precursor of a heat resistant resin, heat resistant resin, insulating film and semiconductor device SUMITOMO BAKELITE CO., LTD. (JP) 2002-01-31 US disclosed