SCHEMBL5676038

SCHEMBL5676038

CCOC(C)OC(=O)CBr

nearest known ligand 0.48

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 2/20 0.48
ALDH1A1 P00352 1/20 0.48
LMNA P02545 3/20 0.46
FAAH O00519 3/20 0.35
CNR1 P21554 1/20 0.35
CNR2 P34972 1/20 0.35
CYP2C19 P33261 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
MGAM O43451 1/20 0.31
GAA P10253 1/20 0.31
SI P14410 1/20 0.31
MGAM2 Q2M2H8 1/20 0.31
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4438144 0.84 TRPA1 (0.46) TRPA1ALDH1A1LMNAFAAHCNR1
SCHEMBL2306711 0.82 LMNA (0.50) TRPA1ALDH1A1LMNAMGAMGAA
SCHEMBL9598364 0.82 LMNA (0.50) TRPA1ALDH1A1LMNAFAAHCNR1
SCHEMBL106759 0.82 LMNA (0.50) TRPA1ALDH1A1LMNACYP2C19MGAM
SCHEMBL5512305 0.80 LMNA (0.48) TRPA1ALDH1A1LMNAMGAMGAA
SCHEMBL5512302 0.80 LMNA (0.48) TRPA1ALDH1A1LMNAMGAMGAA
SCHEMBL2304444 0.78 LMNA (0.53) ALDH1A1LMNA
SCHEMBL8817117 0.78 ALDH1A1 (0.46) ALDH1A1LMNA
SCHEMBL5675738 0.78 LMNA (0.46) LMNAFAAHMGAMGAASI
SCHEMBL10565248 0.78 LMNA (0.46) LMNAMGAMGAASIMGAM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260048024-A1 ACID-RESPONSIVE POLYMER ADDITIVES INCREASE RNA TRANSFECTION FROM LIPID NANOPARTICLES GOVERNING COUNCIL UNIV TORONTO (CA) 2026-02-19 US claimed
US-20260048024-A1 ACID-RESPONSIVE POLYMER ADDITIVES INCREASE RNA TRANSFECTION FROM LIPID NANOPARTICLES GOVERNING COUNCIL UNIV TORONTO (CA) 2026-02-19 US disclosed
EP-0908473-B1 Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process SHINETSU CHEMICAL CO (JP) 2006-02-01 EP disclosed
US-6613844-B2 Polyhydroxystyrene type polymer containing acid labile groups, endcapped and optionally crosslinked; improved alkali dissolution contrast, sensitivity, resolution, plasma etching resistance, heat resistance, and reproducibility SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-09-02 US disclosed
US-6602970-B2 A 2-cyanoacrylate composition has high curing rate and excellent moisture resistance, surface curability containing a cyclic phenol sulfide derivative TOAGOSEI CO., LTD. (JP) 2003-08-05 US disclosed
US-20030013832-A1 Novel styrene polymer, chemically amplified positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-01-16 US disclosed
EP-0908783-B1 Resist compositions, their preparation and use for patterning processes SHINETSU CHEMICAL CO (JP) 2002-07-31 EP disclosed
US-6384169-B1 POLYHYDROXYSTYRENE WITH ACID LABILE GROUP, MODIFIED AT ENDS WITH ALKYLS, ESTERS OR ALCOHOLS; INCREASED DISSOLUTION RATE, HIGH SENSITIVITY AND RESOLUTION; RESIST PATTERNS HAVE PLASMA ETCHING RESISTANCE, HEAT RESISTANCE, REPRODUCIBILITY SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-05-07 US disclosed
US-20020029848-A1 2-cyanoacrylate composition TOAGOSEI CO., LTD. 2002-03-14 US disclosed
US-6136502-A COMPRISING ORGANIC SOLVENT, AT LEAST TWO POLYMERS WITH WEIGHT AVERAGE MOLECULAR WEIGHTS OF 1,000-500,000 WHICH HAVE AT LEAST ONE TYPE OF ACID LABILE GROUP AND ARE CROSSLINKED WITHIN A MOLECULE AND/OR BETWEEN MOLECULES, PHOTOACID GENERATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-10-24 US disclosed
US-6066433-A SILICONE POLYMER CONTAINING PHENOLIC HYDROXYL GROUPS HAVING HYDROGEN ATOMS OF SOME PHENOLIC HYDROXYL GROUPS REPLACED BY ACID LABILE GROUPS, CROSSLINKED AT SOME OF THE REMAINING PHENOLIC HYDROXYL GROUPS WITH GROUPS HAVING ETHER LINKAGES SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-05-23 US disclosed
EP-0908473-A1 Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-04-14 EP disclosed
EP-0908783-A1 Resist compositions, their preparation and use for patterning processes SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-04-14 EP disclosed
EP-0363034-B1 Polycyclic dyes ZENECA LTD (GB) 1995-01-04 EP disclosed
EP-0605404-A2 Polycyclic dyes ZENECA LIMITED (GB) 1994-07-06 EP disclosed
US-5212313-A For polyester IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1993-05-18 US disclosed
US-5183888-A Reacting a phenyl tartronic acid with a dihydrobenzofuran, oxidizing, to get dihydrobenzodifuran IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1993-02-02 US disclosed
EP-0476865-A1 Resist material and process for forming pattern using the same WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1992-03-25 EP disclosed
US-5084580-A Aniline dyes for polyester fabrics to give green and blue color IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1992-01-28 US disclosed
EP-0363034-A2 Polycyclic dyes ZENECA LIMITED (GB) 1990-04-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260048024-A1 ACID-RESPONSIVE POLYMER ADDITIVES INCREASE RNA TRANSFECTION FROM LIPID NANOPARTICLES PCBP1, PTBP3, PABPC4 TRPA1 878/4885ALDH1A1 4330/4885LMNA 129/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.