Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.46 |
| ▸ | FAAH | O00519 | 1/20 | 0.35 |
| ▸ | MGAM | O43451 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | SI | P14410 | 1/20 | 0.31 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10725786 | 0.84 | FAAH (0.36) | LMNAFAAH | |
| SCHEMBL9598364 | 0.82 | LMNA (0.50) | LMNAFAAHMGAMGAASI | |
| SCHEMBL2306711 | 0.82 | LMNA (0.50) | LMNAMGAMGAASIMGAM2 | |
| SCHEMBL106759 | 0.82 | LMNA (0.50) | LMNAMGAMGAASIMGAM2 | |
| SCHEMBL8014667 | 0.80 | FAAH (0.41) | LMNAFAAHTHRB | |
| SCHEMBL5512305 | 0.80 | LMNA (0.48) | LMNAMGAMGAASIMGAM2 | |
| SCHEMBL5512302 | 0.80 | LMNA (0.48) | LMNAMGAMGAASIMGAM2 | |
| SCHEMBL5676038 | 0.78 | TRPA1 (0.48) | LMNAFAAHMGAMGAASI | |
| SCHEMBL2304444 | 0.78 | LMNA (0.53) | LMNA | |
| SCHEMBL8817117 | 0.78 | ALDH1A1 (0.46) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0908473-B1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHINETSU CHEMICAL CO (JP) | 2006-02-01 | — | — | EP | disclosed |
| US-6613844-B2 | Polyhydroxystyrene type polymer containing acid labile groups, endcapped and optionally crosslinked; improved alkali dissolution contrast, sensitivity, resolution, plasma etching resistance, heat resistance, and reproducibility | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-02 | — | — | US | disclosed |
| US-20030013832-A1 | Novel styrene polymer, chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-16 | — | — | US | disclosed |
| EP-0908783-B1 | Resist compositions, their preparation and use for patterning processes | SHINETSU CHEMICAL CO (JP) | 2002-07-31 | — | — | EP | disclosed |
| US-6384169-B1 | POLYHYDROXYSTYRENE WITH ACID LABILE GROUP, MODIFIED AT ENDS WITH ALKYLS, ESTERS OR ALCOHOLS; INCREASED DISSOLUTION RATE, HIGH SENSITIVITY AND RESOLUTION; RESIST PATTERNS HAVE PLASMA ETCHING RESISTANCE, HEAT RESISTANCE, REPRODUCIBILITY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-07 | — | — | US | disclosed |
| US-6136502-A | COMPRISING ORGANIC SOLVENT, AT LEAST TWO POLYMERS WITH WEIGHT AVERAGE MOLECULAR WEIGHTS OF 1,000-500,000 WHICH HAVE AT LEAST ONE TYPE OF ACID LABILE GROUP AND ARE CROSSLINKED WITHIN A MOLECULE AND/OR BETWEEN MOLECULES, PHOTOACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-10-24 | — | — | US | disclosed |
| US-6066433-A | SILICONE POLYMER CONTAINING PHENOLIC HYDROXYL GROUPS HAVING HYDROGEN ATOMS OF SOME PHENOLIC HYDROXYL GROUPS REPLACED BY ACID LABILE GROUPS, CROSSLINKED AT SOME OF THE REMAINING PHENOLIC HYDROXYL GROUPS WITH GROUPS HAVING ETHER LINKAGES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-05-23 | — | — | US | disclosed |
| US-6033828-A | POLYVINYLPHENOL DERIVATIVES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-03-07 | — | — | US | disclosed |
| US-6030746-A | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPRISES A ORGANIC SOLVENT, AN ALKALI SOLUBLE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION RATE REGULATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-02-29 | — | — | US | disclosed |
| EP-0908783-A1 | Resist compositions, their preparation and use for patterning processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0908473-A1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |