Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.37 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | SLC18A3 | Q16572 | 1/20 | 0.36 |
| ▸ | CHRM2 | P08172 | 5/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.33 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12118788 | 1.00 | TSHR (0.40) | TSHRKMT2AMEN1SLC18A3CHRM2 | |
| SCHEMBL2739848 | 0.94 | — | — | |
| SCHEMBL5863104 | 0.87 | — | — | |
| SCHEMBL7112848 | 0.83 | MEN1 (0.33) | KMT2AMEN1 | |
| SCHEMBL27431134 | 0.83 | MEN1 (0.33) | KMT2AMEN1 | |
| SCHEMBL9569737 | 0.82 | KMT2A (0.36) | TSHRKMT2AMEN1SLC6A3 | |
| SCHEMBL219412 | 0.81 | ALDH1A1 (0.40) | TSHRKMT2AMEN1SLC6A3ALDH1A1 | |
| SCHEMBL3839822 | 0.81 | MEN1 (0.34) | TSHRKMT2AMEN1SLC6A3ALDH1A1 | |
| SCHEMBL6554397 | 0.81 | MEN1 (0.38) | KMT2AMEN1SLC6A3 | |
| SCHEMBL9354384 | 0.81 | MEN1 (0.41) | KMT2AMEN1SLC6A3ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 155 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026099466-A1 | TARGETED PROTEIN DEGRADATION | MONTE ROSA THERAPEUTICS AG (CH) | 2026-05-15 | — | — | WO | disclosed |
| WO-2025128624-A2 | HYBRID PEPTIDE COMPOUNDS HAVING A SUBSTITUTED TRYPTOPHAN RESIDUE OR A TERMINAL SUBSTITUENT | CARMOT THERAPEUTICS, INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| CN-112236426-B | Process for preparing 2,4, 5-trisubstituted 1,2, 4-triazolones | 拜耳股份有限公司 | 2024-07-05 | — | — | CN | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230305392-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305395-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20070246249-A1 | Metal Pattern Forming Methd, Metal Pattern Obtained by the Same, Printed Wiring Board, Conductive Film Forming Method, and Conductive Film Obtained by the Same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-10-25 | — | — | US | disclosed |
| US-7279195-B2 | Method of forming metal fine particle pattern and method of forming electroconductive pattern | FUJIFILM CORPORATION (JP) | 2007-10-09 | — | — | US | disclosed |
| US-7279195-B2 | Method of forming metal fine particle pattern and method of forming electroconductive pattern | FUJIFILM CORPORATION (JP) | 2007-10-09 | — | — | US | disclosed |
| US-20070218403-A1 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION | 2007-09-20 | — | — | US | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20070166639-A1 | Laminated resist used for immersion lithography | DAIKIN INDUSTRIES LTD. (JP) | 2007-07-19 | — | — | US | disclosed |
| US-7157193-B2 | Image forming material, color filter master plate, and color filter | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| EP-1714637-A2 | Stable composition for hair dye comprising a fragrance | Takasago International Corporation (JP) | 2006-10-25 | — | — | EP | disclosed |
| US-6372854-B1 | POLYALKENAMERS USED AS PHOTORESISTS HAVING EXCELLENT OPTICAL ELECTRICAL PROPERTIES; HIGH RIGIDITY; HEAT RESISTANCE; ADHESION AND WEAR RESISTANCE; HYDROGENATION; ACIDOLYSIS | MITSUI CHEMICALS, INC. (JP) | 2002-04-16 | — | — | US | disclosed |
| US-4297129-A | HERBICIDES; WILD OATS; NONPHYTOTOXIC | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1981-10-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | TSHR 847/4885KMT2A 2023/4885MEN1 2790/4885 |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, H1-0, BET1 | TSHR 2382/4885KMT2A 521/4885MEN1 1440/4885 |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | HCAR1, H1-0, H1-10 | TSHR 1747/4885KMT2A 1013/4885MEN1 3402/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.