SCHEMBL5707358

SCHEMBL5707358

CCCCCCCCCCCCc1ccccc1S(=O)(=O)OC(CO)(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
PPARA Q07869 3/20 0.37
CES2 O00748 2/20 0.37
CES1 P23141 2/20 0.37
BID P55957 3/20 0.37
MCL1 Q07820 3/20 0.37
BCL2L1 Q07817 2/20 0.37
BAK1 Q16611 2/20 0.37
KAT8 Q9H7Z6 2/20 0.37
PPARG P37231 2/20 0.37
EP300 Q09472 1/20 0.37
KAT2A Q92830 1/20 0.37
KAT2B Q92831 1/20 0.37
KAT5 Q92993 1/20 0.37
SAE1 Q9UBE0 1/20 0.37
THRA P10827 1/20 0.37
THRB P10828 1/20 0.37
CYSLTR2 Q9NS75 4/20 0.36
CYSLTR1 Q9Y271 4/20 0.36
LIPG Q9Y5X9 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL503875 0.80 CES1 (0.42) CES2CES1
SCHEMBL2903853 0.80 CES1 (0.42) CES2CES1
SCHEMBL503385 0.80 CES1 (0.42) CES2CES1
SCHEMBL1639941 0.79 LIPG (0.41) PPARABIDMCL1BCL2L1BAK1
SCHEMBL6900986 0.79 LIPG (0.41) PPARABIDMCL1BCL2L1BAK1
SCHEMBL452943 0.78 KMT2A (0.38) CES1
SCHEMBL1639258 0.77 LIPG (0.39) PPARABIDMCL1BCL2L1BAK1
SCHEMBL6896605 0.77 LIPG (0.39) PPARABIDMCL1BCL2L1BAK1
SCHEMBL5913016 0.74 CES1 (0.45) CES2CES1
SCHEMBL504243 0.72 RECQL (0.45) CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1011029-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-08-30 EP disclosed
US-6337171-B1 AS A RESIST APPLICABLE TO FAR ULTRAVIOLET RAYS SUCH AS A KRF EXCIMER LASER, CHARGED PARTICLE RAYS SUCH AS ELECTRON BEAMS, AND X-RAYS JSR CORPORATION (JP) 2002-01-08 US disclosed
EP-1011029-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2000-06-21 EP disclosed