Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 4/20 | 0.42 |
| ▸ | CES2 | O00748 | 3/20 | 0.42 |
| ▸ | NAAA | Q02083 | 1/20 | 0.38 |
| ▸ | MMP1 | P03956 | 1/20 | 0.38 |
| ▸ | MMP9 | P14780 | 1/20 | 0.38 |
| ▸ | MMP13 | P45452 | 1/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.35 |
| ▸ | CTSG | P08311 | 1/20 | 0.35 |
| ▸ | CTRB1 | P17538 | 1/20 | 0.35 |
| ▸ | CMA1 | P23946 | 1/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL503385 | 1.00 | CES1 (0.42) | CES1CES2NAAAMMP1MMP9 | |
| SCHEMBL2903853 | 1.00 | CES1 (0.42) | CES1CES2NAAAMMP1MMP9 | |
| SCHEMBL5707358 | 0.80 | PPARA (0.37) | CES1CES2 | |
| SCHEMBL5913016 | 0.79 | CES1 (0.45) | CES1CES2PTPN1 | |
| SCHEMBL11579454 | 0.77 | CES1 (0.42) | CES1CES2PTPN1 | |
| SCHEMBL1255415 | 0.77 | LMNA (0.50) | CES1CES2KCNH2 | |
| SCHEMBL9575220 | 0.77 | CES1 (0.40) | CES1CES2NAAAMMP1MMP9 | |
| SCHEMBL455255 | 0.76 | CES1 (0.44) | CES1CES2PTPN1 | |
| SCHEMBL2903855 | 0.75 | NAAA (0.43) | CES1CES2NAAAMMP1MMP9 | |
| SCHEMBL503876 | 0.75 | NAAA (0.43) | CES1CES2NAAAMMP1MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| EP-1950610-B1 | IMMERSION LITHOGRAPHIC COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-20120028198-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20100003615-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2010-01-07 | — | — | US | disclosed |
| EP-1950610-A1 | COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2008-07-30 | — | — | EP | disclosed |