Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 4/20 | 0.42 |
| ▸ | CES2 | O00748 | 3/20 | 0.42 |
| ▸ | NAAA | Q02083 | 1/20 | 0.38 |
| ▸ | MMP1 | P03956 | 1/20 | 0.38 |
| ▸ | MMP9 | P14780 | 1/20 | 0.38 |
| ▸ | MMP13 | P45452 | 1/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.35 |
| ▸ | CTSG | P08311 | 1/20 | 0.35 |
| ▸ | CTRB1 | P17538 | 1/20 | 0.35 |
| ▸ | CMA1 | P23946 | 1/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL503875 | 1.00 | CES1 (0.42) | CES1CES2NAAAMMP1MMP9 | |
| SCHEMBL2903853 | 1.00 | CES1 (0.42) | CES1CES2NAAAMMP1MMP9 | |
| SCHEMBL5707358 | 0.80 | PPARA (0.37) | CES1CES2 | |
| SCHEMBL5913016 | 0.79 | CES1 (0.45) | CES1CES2PTPN1 | |
| SCHEMBL11579454 | 0.77 | CES1 (0.42) | CES1CES2PTPN1 | |
| SCHEMBL1255415 | 0.77 | LMNA (0.50) | CES1CES2KCNH2 | |
| SCHEMBL9575220 | 0.77 | CES1 (0.40) | CES1CES2NAAAMMP1MMP9 | |
| SCHEMBL455255 | 0.76 | CES1 (0.44) | CES1CES2PTPN1 | |
| SCHEMBL2903855 | 0.75 | NAAA (0.43) | CES1CES2NAAAMMP1MMP9 | |
| SCHEMBL503876 | 0.75 | NAAA (0.43) | CES1CES2NAAAMMP1MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| US-20200272050-A1 | Enhanced EUV Photoresist Materials, Formulations and Processes | IRRESISTIBLE MATERIALS, LTD (GB) | 2020-08-27 | — | — | US | disclosed |
| US-10095112-B2 | Multiple trigger photoresist compositions and methods | IRRESISTIBLE MATERIALS LTD (GB) | 2018-10-09 | — | — | US | disclosed |
| US-20180246408-A1 | MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHODS | IRRESISTIBLE MATERIALS, LTD (GB) | 2018-08-30 | — | — | US | disclosed |
| US-9383646-B2 | Two-step photoresist compositions and methods | IRRESISTIBLE MATERIALS LTD (GB) | 2016-07-05 | — | — | US | disclosed |
| US-9323149-B2 | Methanofullerenes | IRRESISTIBLE MATERIALS LTD (GB) | 2016-04-26 | — | — | US | disclosed |
| US-9256126-B2 | Methanofullerenes | IRRESISTIBLE MATERIALS LTD (GB) | 2016-02-09 | — | — | US | disclosed |
| EP-2920142-A1 | METHANOFULLERENES | Robinson, Alex Philip, Graham (GB) | 2015-09-23 | — | — | EP | disclosed |
| US-20150241773-A1 | Two-Step Photoresist Compositions and Methods | IRRESISTIBLE MATERIALS LTD (GB) | 2015-08-27 | — | — | US | disclosed |
| WO-2014137663-A1 | METHANOFULLERENES | ROBINSON ALEX PHILIP GRAHAM (GB) | 2014-09-12 | — | — | WO | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-0793144-B1 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-17 | — | — | EP | disclosed |
| US-6136500-A | CONTAINS A PHOTOACID GENERATOR COMPRISING A COMBINATION OF A COMPOUND THAT GENERATES A CARBOXYLIC ACID UPON EXPOSURE TO RADIATION AND ANOTHER COMPOUND THAT GENERATES ANOTHER ACID UPON EXPOSURE TO RADIATION | JSR CORPORATION (JP) | 2000-10-24 | — | — | US | disclosed |
| EP-1035436-A1 | Resist pattern formation method | JSR Corporation (JP) | 2000-09-13 | — | — | EP | disclosed |
| EP-1011029-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2000-06-21 | — | — | EP | disclosed |
| US-5962180-A | COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT | JSR CORPORATION (JP) | 1999-10-05 | — | — | US | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10095112-B2 | Multiple trigger photoresist compositions and methods | ERCC4, ERCC2, APEX1 | CES1 2793/4885CES2 1971/4885NAAA 1296/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.