SCHEMBL5713263

SCHEMBL5713263

O=S(=O)(O)c1ncccc1C(Br)(Br)Br

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
COMT P21964 1/20 0.38
NAPRT Q6XQN6 1/20 0.37
NFE2L2 Q16236 4/20 0.37
KDM4E B2RXH2 2/20 0.37
ALOX12 P18054 1/20 0.37
ALDH1A1 P00352 2/20 0.36
TDP1 Q9NUW8 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
LMNA P02545 1/20 0.36
MAPT P10636 1/20 0.36
HTT P42858 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
CYP1A2 P05177 1/20 0.36
ALOX15 P16050 1/20 0.36
HIF1A Q16665 1/20 0.36
HSD17B10 Q99714 1/20 0.36
KMT2A Q03164 3/20 0.33
MEN1 O00255 2/20 0.33
RAB9A P51151 1/20 0.33
PAX8 Q06710 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3904354 0.84 NFE2L2 (0.39) NFE2L2KDM4EALOX12ALDH1A1TDP1
SCHEMBL8430567 0.83 NFE2L2 (0.52) NFE2L2TDP1GAA
Hydrochloric Acid SCHEMBL27792294 0.81 NFE2L2 (0.51) NFE2L2TDP1GAA
SCHEMBL8430463 0.81 NFE2L2 (0.51) NFE2L2TDP1GAA
SCHEMBL28009617 0.76 COMT (0.40) COMTNAPRTKDM4EALOX12ALDH1A1
SCHEMBL5677667 0.75 HTR6 (0.39) NFE2L2TDP1KMT2AMEN1RAB9A
Hydrochloric Acid SCHEMBL28047305 0.74 COMT (0.39) COMTNAPRTKDM4EALOX12ALDH1A1
SCHEMBL29564068 0.74 COMT (0.49) COMTNAPRTNFE2L2KDM4EALOX12
SCHEMBL2112972 0.74 COMT (0.49) COMTNAPRTNFE2L2KDM4EALOX12
SCHEMBL7081072 0.74 KDM4E (0.53) COMTNAPRTKDM4EALOX12ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0990948-B1 A thermally developable material KONICA CORP (JP) 2006-11-29 EP disclosed
EP-1300726-B1 Photothermographic material comprising fragmentable electron donor FUJI PHOTO FILM CO LTD (JP) 2005-12-21 EP disclosed
US-6787298-B2 INCLUDING SENSITIZERS THAT CAN, AFTER THEY ARE ONE ELECTRON-OXIDIZED, FURTHER RELEASE TWO OR MORE ELECTRONS, PREFERABLY THREE OR MORE ELECTRONS, DUE TO SPONTANEOUS DISSOCIATION FUJI PHOTO FILM CO., LTD. (JP) 2004-09-07 US disclosed
EP-1300726-A1 Photothermographic material comprising fragmentable electron donor FUJI PHOTO FILM CO., LTD. (JP) 2003-04-09 EP disclosed
US-6190854-B1 LAYER CONTAINING ORGANIC SILVER SALTS; SMOOSTER VALUE ON THE SURFACE OF SAID IMAGE FORMING LAYER SIDE OF SAID THERMALLY DEVELOPABLE MATERIAL IS NOT MORE THAN 40 MM HG; FLUORINE CONTAINING SURFACTANT. KONICA CORPORATION (JP) 2001-02-20 US disclosed
EP-0990948-A1 A thermally developable material KONICA CORPORATION (JP) 2000-04-05 EP disclosed