SCHEMBL572796

SCHEMBL572796

O=C(O)C1=C(C(=O)O)C2C=CC1C2

nearest known ligand 0.33

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.33
POLB P06746 2/20 0.33
TSHR P16473 2/20 0.32
MAPK1 P28482 1/20 0.32
HSD17B10 Q99714 1/20 0.32
TP53 P04637 1/20 0.32
THRB P10828 1/20 0.31
BLM P54132 1/20 0.31
PMP22 Q01453 1/20 0.31
KMT2A Q03164 1/20 0.31
APEX1 P27695 1/20 0.31
ABAT P80404 1/20 0.30
GABRR1 P24046 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10195120 1.00 TDP1 (0.33) TDP1POLBTSHRMAPK1HSD17B10
SCHEMBL12804670 0.86
SCHEMBL13947949 0.82 SLC6A3 (0.38) TDP1TSHRMAPK1KMT2A
SCHEMBL9791096 0.77 ALDH1A1 (0.49) TDP1POLBTSHRHSD17B10TP53
SCHEMBL9354912 0.76 LMNA (0.42) TSHRKMT2A
SCHEMBL12096096 0.69
SCHEMBL4192960 0.69 SLC6A3 (0.42) TDP1POLBTSHRHSD17B10
SCHEMBL8713429 0.68 ALDH1A1 (0.50) POLBTSHRHSD17B10
SCHEMBL18634185 0.66
SCHEMBL75668 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117510798-A Cycloolefin polymer, preparation method thereof and medical packaging material 杭州睿丰融创科技有限公司 2024-02-06 CN claimed
CN-114410016-B Polypropylene composition, method for preparing toughened impact-resistant copolymer polypropylene resin, toughened impact-resistant copolymer polypropylene resin and application thereof 国家能源集团宁夏煤业有限责任公司 2023-10-13 CN claimed
CN-112538215-B Impact-resistant low-temperature-resistant high-transparency polypropylene composition 茂名骐锋新材料有限公司 2023-07-25 CN claimed
CN-114410016-A Polypropylene composition, method for preparing toughened impact-resistant co-polypropylene resin, toughened impact-resistant co-polypropylene resin and application thereof 国家能源集团宁夏煤业有限责任公司 2022-04-29 CN claimed
CN-114106456-A Low-density low-shrinkage high-gloss polypropylene composite and preparation method and product thereof 浙江兴越材料技术有限公司 2022-03-01 CN claimed
CN-110565191-A Ice-cool fabric with sweat releasing and moisture absorbing functions and preparation method thereof 朱建余 2019-12-13 CN claimed
JP-2018921-A None JP disclosed
US-12466956-B2 Electroconductive resin composition and molded article of same DENKA COMPANY LIMITED (JP) 2025-11-11 US disclosed
CN-117510798-A Cycloolefin polymer, preparation method thereof and medical packaging material 杭州睿丰融创科技有限公司 2024-02-06 CN disclosed
CN-114106456-B Low-density low-shrinkage high-gloss polypropylene compound, preparation method thereof and product thereof 浙江兴越材料技术有限公司 2023-11-10 CN disclosed
CN-114410016-B Polypropylene composition, method for preparing toughened impact-resistant copolymer polypropylene resin, toughened impact-resistant copolymer polypropylene resin and application thereof 国家能源集团宁夏煤业有限责任公司 2023-10-13 CN disclosed
WO-2023189133-A1 CONDUCTIVE RESIN COMPOSITION デンカ株式会社 2023-10-05 WO disclosed
CN-116410449-A Polymer resin and method for producing same 南亚塑胶工业股份有限公司 2023-07-11 CN disclosed
US-20080094777-A1 Electric double layer capacitor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-04-24 US disclosed
EP-1905740-A1 ELECTRIC DOUBLE LAYER CAPACITOR Sumitomo Chemical Company, Limited (JP) 2008-04-02 EP disclosed
EP-1876611-A1 ELECTRIC DOUBLE LAYER CAPACITOR Sumitomo Chemical Company, Limited (JP) 2008-01-09 EP disclosed
EP-1091958-A1 SALTS OF PAROXETINE SMITHKLINE BEECHAM PLC (GB) 2001-04-18 EP disclosed
WO-2000001692-A1 SALTS OF PAROXETINE SMITHKLINE BEECHAM PLC (GB) 2000-01-13 WO disclosed
EP-0772642-B1 STRONG CARBOXYLIC ACID FUNCTIONAL POLYURETHANE POLYMERS AND BLENDS THEREOF USED IN MAGNETIC RECORDING MEDIA MINNESOTA MINING & MFG (US) 1998-10-07 EP disclosed
JP-H0218921-A ELECTROLYTE FOR DRIVING ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR MATSUSHITA ELECTRIC IND CO LTD 1990-01-23 JP disclosed