SCHEMBL57611

SCHEMBL57611

COC([SiH3])(CCN)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL57181 0.83 KIF11 (0.32)
SCHEMBL56325 0.81 NFKB1 (0.35)
SCHEMBL16892641 0.79 DNM1 (0.38)
SCHEMBL28575057 0.79 DNM1 (0.38)
SCHEMBL40404 0.79 CA12 (0.44)
Ethylamine SCHEMBL3813584 0.78 FDPS (0.31)
SCHEMBL11036494 0.78 CA12 (0.42)
Ammonia Solution, Strong SCHEMBL22712951 0.76 CA12 (0.41)
SCHEMBL6444276 0.76 CA12 (0.41)
SCHEMBL2446916 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 322 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6214414-B1 HEATING TO CERAMIC SUBSTRATE HAVING SEQUENCE OF COATINGS OF PIGMENTED COATING TO CROSSLINK ALL OF PIGMENTED COATING OF SEQUENCE AND TO ADHERE SEQUENCE TO THE CERAMIC SUBSTRATE PPG INDUSTRIES OHIO, INC. 2001-04-10 US claimed
EP-0330456-B1 Preparation of silicon-containing polyimide precursor and cured polyimides obtained therefrom CHISSO CORP (JP) 1994-09-07 EP claimed
US-20260125587-A1 PROCESS FOR PRODUCING A STORAGE-STABLE ACTIVATOR FOR GLASS AND CERAMIC SUBSTRATES SIKA TECHNOLOGY AG (CH) 2026-05-07 US disclosed
US-20260062596-A1 SILANE-TERMINATED POLYMERS MERZ + BENTELI AG (CH) 2026-03-05 US disclosed
US-20260028450-A1 SILANE-TERMINATED POLYMERS MERZ + BENTELI AG (CH) 2026-01-29 US disclosed
EP-3255113-B1 ADHESIVE AND/OR SEALANT COMPOSITION WITH HIGH INITIAL TACK SOUDAL (BE) 2025-11-05 EP disclosed
US-12391853-B2 Adhesive formulations for roofing applications and related methods BMIC LLC (US) 2025-08-19 US disclosed
EP-4587501-A1 PROCESS FOR PRODUCING A STORAGE-STABLE ACTIVATOR FOR GLASS AND CERAMIC SUBSTRATES Sika Technology AG (CH) 2025-07-23 EP disclosed
EP-4574865-A1 COATING PRIMER HAVING GOOD APPLICABILITY AT LOW TEMPERATURES Sika Technology AG (CH) 2025-06-25 EP disclosed
EP-4558537-A1 SILANE-TERMINATED POLYMERS MERZ + BENTELI AG (CH) 2025-05-28 EP disclosed
EP-4558538-A1 SILANE-TERMINATED POLYMERS MERZ + BENTELI AG (CH) 2025-05-28 EP disclosed
US-5026788-A Photosensitive polymer having thiol group CHISSO CORPORATION (JP) 1991-06-25 US disclosed
US-5025088-A Photosensitive poly(amide)imide heat-resistant polymer CHISSO CORPORATION (JP) 1991-06-18 US disclosed
US-4963635-A REACTING A FLUORINE-CONTAINING DIANHYDRIDE OR DIANHYDRIDE, A FLUORINE-CONTAINING DIAMINE OR A DEIAMINE AND AN AMINO-CONTAINING OXYSILANE COMPOUND CHISSO CORPORATION (JP) 1990-10-16 US disclosed
EP-0379377-A2 Process for preparing photosensitive heat-resistant polymer Chisso Corporation (JP) 1990-07-25 EP disclosed
EP-0348092-A2 Photosensitive polymer having thiol groups Chisso Corporation (JP) 1989-12-27 EP disclosed
EP-0341028-A2 Process for the preparation of photosensitive polymers Chisso Corporation (JP) 1989-11-08 EP disclosed
EP-0337698-A2 Photosensitive Polymer Chisso Corporation (JP) 1989-10-18 EP disclosed
US-3950308-A POLYAMIDES, POLYIMIDES, POLYAMIDE-IMIDES CIBA-GEIGY CORPORATION (US) 1976-04-13 US disclosed
US-3948835-A POLYAMIDE, POLYAMIDE-ACID OR POLYAMIDE-AMIDE-ACIDS CIBA-GEIGY CORPORATION (US) 1976-04-06 US disclosed