SCHEMBL58163

SCHEMBL58163

CN(C)C(C)(C)C(=O)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 5/20 0.50
SRC P12931 1/20 0.46
RAB9A P51151 2/20 0.44
NPC1 O15118 1/20 0.44
HPGD P15428 1/20 0.44
ALDH1A1 P00352 2/20 0.42
TSHR P16473 2/20 0.42
KMT2A Q03164 2/20 0.42
HSD17B10 Q99714 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
RECQL P46063 1/20 0.42
CES2 O00748 3/20 0.42
DAO P14920 1/20 0.42
NAPRT Q6XQN6 1/20 0.42
MEN1 O00255 1/20 0.42
POLB P06746 1/20 0.42
MLYCD O95822 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C19 P33261 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10941473 0.92 RAB9A (0.56) CES1RAB9ANPC1HPGDCES2
SCHEMBL9681255 0.92 HPGD (0.56) CES1RAB9ANPC1HPGDALDH1A1
SCHEMBL29242353 0.88 MAPT (0.52) RAB9ANPC1HPGDALDH1A1KMT2A
SCHEMBL14156791 0.84 SMN1; SMN2 (0.53) RAB9ANPC1HPGDALDH1A1KMT2A
SCHEMBL10384767 0.84 HPGD (0.56) CES1RAB9ANPC1HPGDALDH1A1
SCHEMBL25747306 0.83 CES1 (0.47) CES1SRCRAB9ANPC1HPGD
SCHEMBL10947494 0.83 CES2 (0.44) CES1RAB9AHPGDALDH1A1CES2
SCHEMBL10945414 0.83 HPGD (0.50) RAB9ANPC1HPGDALDH1A1
SCHEMBL11258091 0.82 KDM4E (0.49) CES1SRCRAB9ANPC1HPGD
SCHEMBL58267 0.81 CA2 (0.50) CES1RAB9ANPC1HPGDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 118 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8338500-B2 Binder composition and photosensitive composition including the same HON HAI PRECISION INDUSTRY CO., LTD. (TW) 2012-12-25 US claimed
US-20100148134-A1 Binder composition and photosensitive composition including the same HON HAI PRECISION INDUSTRY CO., LTD. (TW) 2010-06-17 US claimed
US-20080180503-A1 INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2008-07-31 US claimed
US-20080176169-A1 BINDER COMPOSITION AND PHOTOSENSITIVE COMPOSITION INCLUDING THE SAME ICF TECHNOLOGY LIMITED. (US) 2008-07-24 US claimed
WO-2025057864-A1 ORGANIC EL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING SAME TOPPANホールディングス株式会社 2025-03-20 WO disclosed
US-11650499-B2 Photosensitive resin composition, organic EL element barrier rib, and organic EL element SHOWA DENKO K.K. (JP) 2023-05-16 US disclosed
US-11599023-B2 Photosensitive resin composition, organic EL element barrier rib, and organic EL element SHOWA DENKO K.K. (JP) 2023-03-07 US disclosed
WO-2023003011-A1 THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION 昭和電工株式会社 2023-01-26 WO disclosed
US-11512204-B2 Squarylium dye and composition containing same TOYO INK SC HOLDINGS CO., LTD. (JP) 2022-11-29 US disclosed
US-20220275241-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION WALL SHOWA DENKO K.K. (JP) 2022-09-01 US disclosed
US-20220221790-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC EL ELEMENT PARTITION WALL SHOWA DENKO K.K. (JP) 2022-07-14 US disclosed
CN-114502659-A Resin composition, resin sheet, cured film, method for producing cured film, semiconductor device, organic EL display device, and display device 东丽株式会社 2022-05-13 CN disclosed
EP-0153890-B1 DERIVATIVES OF 3-PHENYL-2-PROPENAMINE, THEIR PREPARATION AND MEDICINES CONTAINING THEM RHONE-POULENC SANTE (FR) 1989-01-04 EP disclosed
EP-0003002-B1 USE OF AROMATIC-ALIPHATIC KETONES AS PHOTOINITIATORS, PHOTOPOLYMERISABLE SYSTEMS CONTAINING SUCH KETONES AND AROMATIC-ALIPHATIC KETONES CIBA-GEIGY AG (CH) 1984-06-13 EP disclosed
US-4321118-A Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition CIBA-GEIGY CORPORATION (US) 1982-03-23 US disclosed
US-4318791-A PHOTOPOLYMERIZABLE SYSTEM FOR INKS CIBA-GEIGY CORPORATION (US) 1982-03-09 US disclosed
US-4315807-A Sensitizers for photopolymerization CIBA-GEIGY CORPORATION (US) 1982-02-16 US disclosed
US-4308400-A AROMATIC HYDROXY KETONES CIBA-GEIGY A.G. (CH) 1981-12-29 US disclosed
US-4284485-A STABILIZED WITH A POLYALKYLPIPERIDINE DERIVATIVE CIBA-GEIGY CORPORATION (US) 1981-08-18 US disclosed
EP-0003002-A2 Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones CIBA-GEIGY AG (CH) 1979-07-11 EP disclosed