SCHEMBL58267

SCHEMBL58267

Cc1ccc(C(=O)C(C)(C)N(C)C)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.50
ALDH1A1 P00352 5/20 0.48
CES2 O00748 3/20 0.48
CES1 P23141 3/20 0.48
LMNA P02545 2/20 0.48
SMN1; SMN2 Q16637 2/20 0.46
PKM P14618 2/20 0.43
HTT P42858 2/20 0.43
ATM Q13315 2/20 0.43
NPSR1 Q6W5P4 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
HPGD P15428 1/20 0.43
NLRP1 Q9C000 1/20 0.43
GAA P10253 1/20 0.43
MEN1 O00255 1/20 0.43
NTSR1 P30989 1/20 0.43
KMT2A Q03164 1/20 0.43
NPC1 O15118 2/20 0.43
RAB9A P51151 2/20 0.43
MAPT P10636 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10385994 0.89 LMNA (0.44) CA2ALDH1A1CES2CES1LMNA
SCHEMBL10947494 0.85 CES2 (0.44) ALDH1A1CES2CES1HPGDRAB9A
SCHEMBL10945414 0.85 HPGD (0.50) ALDH1A1LMNAPKMHTTHPGD
SCHEMBL4985655 0.82 PHLPP2 (0.42) ALDH1A1LMNAPKMNPSR1TDP1
SCHEMBL727322 0.82 ALDH1A1 (0.57) ALDH1A1SMN1; SMN2TDP1HPGDGAA
SCHEMBL10384794 0.82 CES2 (0.46) CA2ALDH1A1CES2CES1SMN1; SMN2
SCHEMBL10384774 0.82 CES2 (0.46) CA2CES2CES1NPC1RAB9A
SCHEMBL58163 0.81 CES1 (0.50) ALDH1A1CES2CES1TDP1HPGD
SCHEMBL14156792 0.80 HPGD (0.50) CA2ALDH1A1LMNASMN1; SMN2HTT
SCHEMBL727934 0.79 ACHE (0.33) CA2ALDH1A1LMNANPSR1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080180503-A1 INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2008-07-31 US claimed
WO-2025057864-A1 ORGANIC EL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING SAME TOPPANホールディングス株式会社 2025-03-20 WO disclosed
US-12210285-B2 Resin composition, resin sheet, cured film, method for producing cured film, semiconductor device, and display device TORAY INDUSTRIES, INC. (JP) 2025-01-28 US disclosed
US-20240317942-A1 THIOL-CONTAINING COMPOSITION, PHOTOSETTING COMPOSITION, AND THERMOSETTING COMPOSITION RESONAC CORPORATION (JP) 2024-09-26 US disclosed
EP-4375302-A1 THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION Resonac Corporation (JP) 2024-05-29 EP disclosed
CN-111538209-B Photosensitive resin composition, organic EL element partition wall, and organic EL element 日保丽公司 2024-05-14 CN disclosed
CN-117882497-A Adhesive film for circuit connection, circuit connection structure, and method for producing same 株式会社力森诺科 2024-04-12 CN disclosed
CN-117651722-A Thiol-containing composition, photocurable composition, and thermosetting composition 株式会社力森诺科 2024-03-05 CN disclosed
US-11650499-B2 Photosensitive resin composition, organic EL element barrier rib, and organic EL element SHOWA DENKO K.K. (JP) 2023-05-16 US disclosed
US-11599023-B2 Photosensitive resin composition, organic EL element barrier rib, and organic EL element SHOWA DENKO K.K. (JP) 2023-03-07 US disclosed
US-20080139688-A1 Thiol Compound And Photosensitive Composition Using The Same SHOWA DENKO K.K. (JP) 2008-06-12 US disclosed
EP-1805137-B1 THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME SHOWA DENKO KK (JP) 2008-03-26 EP disclosed
US-7341828-B2 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2008-03-11 US disclosed
US-20070160921-A1 Electrophotographic photoconductor, method of producing the same and image forming apparatus SHARP KABUSHIKI KAISHA (JP) 2007-07-12 US disclosed
US-20070160921-A1 Electrophotographic photoconductor, method of producing the same and image forming apparatus SHARP KABUSHIKI KAISHA (JP) 2007-07-12 US disclosed
EP-1805137-A1 THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME SHOWA DENKO KABUSHIKI KAISHA (JP) 2007-07-11 EP disclosed
WO-2006046736-A1 THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME SHOWA DENKO K.K. (JP) 2006-05-04 WO disclosed
WO-2006046733-A1 THIOL COMPOUND, AND PHOTOSENSITIVE COMPOSITION AND BLACK MATRIX RESIST COMPOSITION USING THE COMPOUND SHOWA DENKO K.K (JP) 2006-05-04 WO disclosed
US-20060036023-A1 Color filter black matrix resist composition SHOWA DENKO K.K. (JP) 2006-02-16 US disclosed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080139688-A1 Thiol Compound And Photosensitive Composition Using The Same TST, TMT1A, CRY1 CA2 1457/4885ALDH1A1 71/4885CES2 3690/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.