Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL8575352

Cc1cc([S+](C)C)ccc1O.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.37

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Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 13/20 0.37
TDP1 Q9NUW8 2/20 0.36
TP53 P04637 1/20 0.36
ESR2 Q92731 8/20 0.35
AR P10275 3/20 0.35
GPR3 P46089 2/20 0.35
PDE10A Q9Y233 1/20 0.34
LMNA P02545 1/20 0.33
ALDH1A1 P00352 1/20 0.32
GAA P10253 1/20 0.32
PKM P14618 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL5828707 0.82 BRD4 (0.35) ESR1TDP1ESR2GPR3LMNA
Trifluoromethanesulfonic Acid SCHEMBL4182001 0.78 KCNH2 (0.43) ESR1TP53ESR2GPR3LMNA
Perchlorate SCHEMBL9574229 0.78 TP53 (0.45) ESR1TDP1TP53ESR2AR
Trifluoromethanesulfonic Acid SCHEMBL30925713 0.77 ENPP2 (0.44) ESR1ESR2GPR3LMNAGAA
Trifluoromethanesulfonic Acid SCHEMBL562050 0.76 GPR3 (0.43) GPR3ALDH1A1GAA
Trifluoromethanesulfonic Acid SCHEMBL30536251 0.74 GPR3 (0.46) GPR3
Trifluoromethanesulfonic Acid SCHEMBL5827967 0.73 ACHE (0.43) GPR3ALDH1A1
Trifluoromethanesulfonic Acid SCHEMBL30536275 0.73 L3MBTL1 (0.40) TDP1GPR3LMNAPKM
Trifluoromethanesulfonic Acid SCHEMBL30536254 0.73 GPR3 (0.40) TDP1GPR3LMNA
Trifluoromethanesulfonic Acid SCHEMBL30536260 0.72 MAPK1 (0.46) TP53LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5783354-A QUATERNARY AMMONIUM COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 1998-07-21 US disclosed
EP-0762207-A2 Positive working photosensitive composition and method of producing relief structures BASF AKTIENGESELLSCHAFT (DE) 1997-03-12 EP disclosed