Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AOC3 | Q16853 | 2/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | IDO1 | P14902 | 1/20 | 0.41 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL28004675 | 0.93 | TDP1 (0.46) | TSHR | |
| SCHEMBL27620642 | 0.88 | IDO1 (0.52) | IDO1SIGMAR1 | |
| SCHEMBL21933321 | 0.84 | LMNA (0.50) | CA1CA2CA9TSHR | |
| SCHEMBL3110174 | 0.84 | CA1 (0.39) | CA1CA2CA9IDO1SIGMAR1 | |
| SCHEMBL3424236 | 0.82 | KMT2A (0.39) | CA1CA2CA9IDO1SIGMAR1 | |
| SCHEMBL4957115 | 0.82 | TAAR1 (0.44) | AOC3SIGMAR1 | |
| SCHEMBL19287395 | 0.82 | CA1 (0.38) | CA1CA2CA9IDO1SIGMAR1 | |
| SCHEMBL23183624 | 0.82 | LPL (0.39) | CA2SIGMAR1 | |
| SCHEMBL2608901 | 0.82 | KCNH2 (0.49) | IDO1 | |
| SCHEMBL112613 | 0.82 | AOC3 (0.46) | AOC3CA1CA2CA9IDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102329194-A | Preparation method of ibuprofen intermediate p-isobutylphenethyl alcohol | UNIV ZHEJIANG TECHNOLOGY | 2012-01-25 | — | — | CN | claimed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| WO-2023214095-A1 | WASP PEST MANAGEMENT SYSTEM | TONER DARADH (IE) | 2023-11-09 | — | — | WO | disclosed |
| US-20230185191-A1 | COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION, RESIST FILM, UNDERLAYER FILM, PATTERN FORMATION METHOD, AND OPTICAL COMPONENT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| CN-108601958-B | Pro-fragrance compositions | 爱客多有限公司 | 2022-06-17 | — | — | CN | disclosed |
| US-20220144738-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD, AND METHOD FOR PURIFYING RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-05-12 | — | — | US | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| EP-3809876-A1 | PROTECTIVE AGENT FOR FOOD PRODUCTS AND THE LIKE AND FOR CURING AND/OR STORAGE ROOMS OF THE SAME | PERPRIN S.R.L. (IT) | 2021-04-28 | — | — | EP | disclosed |
| US-20210063880-A1 | RESIST COMPOSITION AND PATTERN FORMATION METHOD USING SAME, COMPOUND AND RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-04 | — | — | US | disclosed |
| US-20210047457-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-18 | — | — | US | disclosed |
| EP-1553088-A1 | 1-SUBSTITUTED 4-NITROIMIDAZOLE COMPOUND AND PROCESS FOR PRODUCING THE SAME | Otsuka Pharmaceutical Company, Limited (JP) | 2005-07-13 | — | — | EP | disclosed |
| CN-1514848-A | Curable unsaturated resin composition | 大日本油墨化学工业株式会社 | 2004-07-21 | — | — | CN | disclosed |
| CN-1111519-C | Alpha-aromatic ethanol oxonation prepares the method for alpha-aryl propionic acid and ester thereof | LANZHOU INST CHEMICOPHYSICS (CN) | 2003-06-18 | — | — | CN | disclosed |
| EP-0796248-B1 | CARBOSTYRIL DERIVATIVES AS ANTITHROMBOTIC AGENTS | WESTERN THERAPEUTICS INST D (JP) | 2001-08-16 | — | — | EP | disclosed |
| CN-1289759-A | Process for preparing alpha-arylpropionic acid and its salts by oxonation of alpha-arylalcohol | LANZHOU INST CHEMICOPHYSICS (CN) | 2001-04-04 | — | — | CN | disclosed |
| CN-1059890-C | Method of synthetizing alpha-aryl propionic acid by carbonyl process | LANZHOU CHEM PHYS INST (CN) | 2000-12-27 | — | — | CN | disclosed |
| US-6143763-A | Carbostyril derivatives | D. WESTERN THERAPEUTICS INSTITIUTE (JP) | 2000-11-07 | — | — | US | disclosed |
| CN-1221729-A | Method for preparity (S)-alpha-aryl propionic acid and its methyl ester by alpha-aryl ethanol asymmetric carbonylation process | LANZHOU CHEM PHYS INST (CN) | 1999-07-07 | — | — | CN | disclosed |
| CN-1221728-A | Method of synthetizing alpha-aryl propionic acid by carbonyl process | LANZHOU CHEM PHYS INST (CN) | 1999-07-07 | — | — | CN | disclosed |
| US-4243688-A | FOODS, CHOCOLATE | INTERNATIONAL FLAVORS & FRAGRANCES INC. (US) | 1981-01-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | AOC3 4651/4885CA1 1120/4885CA2 3332/4885 |
| US-20230185191-A1 | COMPOUND, PRODUCTION METHOD THEREFOR, ACID GENERATOR, COMPOSITION, RESIST FILM, UNDERLAYER FILM, PATTERN FORMATION METHOD, AND OPTICAL COMPONENT | SOAT2, SOAT1, FAR1 | AOC3 1467/4885CA1 635/4885CA2 1435/4885 |
| US-20220144738-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD, AND METHOD FOR PURIFYING RESIN | RER1, UNC119, FEM1B | AOC3 3087/4885CA1 1483/4885CA2 3516/4885 |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | AOC3 2792/4885CA1 161/4885CA2 1466/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.