SCHEMBL5844320

SCHEMBL5844320

CCCCOc1cc(C)c(S(=O)(=O)C(=[N+]=[N-])C(=O)C(C)(C)C)cc1OCCCC

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.36
HTT P42858 2/20 0.36
WDR5 P61964 3/20 0.34
SMN1; SMN2 Q16637 4/20 0.33
TSHR P16473 3/20 0.33
RARB P10826 1/20 0.33
MAPK1 P28482 1/20 0.33
ESR1 P03372 2/20 0.33
MAPT P10636 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
MCOLN3 Q8TDD5 1/20 0.32
PPARA Q07869 3/20 0.32
S1PR3 Q99500 1/20 0.32
PPARG P37231 2/20 0.32
PPARD Q03181 1/20 0.32
PDIA6 Q15084 1/20 0.32
TTR P02766 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2C8 P10632 1/20 0.31
CHRM1 P11229 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5861978 0.84 MEN1 (0.38) WDR5SMN1; SMN2TSHRMAPK1ESR1
SCHEMBL5845036 0.82 S1PR3 (0.40) LMNAHTTWDR5SMN1; SMN2TSHR
SCHEMBL5844406 0.82 MEN1 (0.36) LMNAHTTTSHRMAPTPPARA
SCHEMBL5843178 0.82 THRA (0.38) LMNAHTTSMN1; SMN2TSHRMAPT
SCHEMBL5845626 0.82 LMNA (0.38) LMNAHTTWDR5SMN1; SMN2TSHR
SCHEMBL5861716 0.81 POLB (0.40) SMN1; SMN2TSHRESR1MAPTNPSR1
SCHEMBL5861740 0.81 ALDH1A1 (0.38) HTTSMN1; SMN2MAPK1ESR1MAPT
SCHEMBL5844389 0.80 S1PR3 (0.33) LMNAWDR5MAPTNPSR1S1PR3
SCHEMBL5861721 0.80 S1PR3 (0.41) ESR1MAPTNPSR1S1PR3TDP1
SCHEMBL5845514 0.80 MMP1 (0.37) LMNAHTTWDR5SMN1; SMN2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 LMNA 597/4885HTT 2186/4885WDR5 3918/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.