SCHEMBL5861978

SCHEMBL5861978

CCCCOc1ccc(C)cc1S(=O)(=O)C(=[N+]=[N-])C(=O)C(C)(C)C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.38
KMT2A Q03164 4/20 0.38
KDM4E B2RXH2 2/20 0.38
GAA P10253 1/20 0.38
POLB P06746 2/20 0.38
PPARA Q07869 3/20 0.37
TSHR P16473 4/20 0.37
CYP2C9 P11712 2/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
TTR P02766 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2C8 P10632 1/20 0.37
CHRM1 P11229 1/20 0.37
ADRA1A P35348 1/20 0.37
PPARG P37231 1/20 0.37
HTR2B P41595 1/20 0.37
SLCO1B3 Q9NPD5 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
CISD1 Q9NZ45 1/20 0.37
SLCO1B1 Q9Y6L6 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5861716 0.97 POLB (0.40) MEN1KMT2AKDM4EGAAPOLB
SCHEMBL5861721 0.96 S1PR3 (0.41) MEN1KMT2AKDM4EGAAPOLB
SCHEMBL5843178 0.90 THRA (0.38) MEN1KMT2AGAAPPARATSHR
SCHEMBL5861740 0.88 ALDH1A1 (0.38) KDM4EGAAPOLBPPARASMN1; SMN2
SCHEMBL5862532 0.84 SMN1; SMN2 (0.39) KDM4EGAAPOLBSMN1; SMN2THRA
SCHEMBL5844320 0.84 LMNA (0.36) PPARATSHRCYP2C9SMN1; SMN2TTR
SCHEMBL5862526 0.84 WDR5 (0.40) MEN1KMT2AKDM4EGAAPOLB
SCHEMBL5861735 0.84 THRA (0.40) KDM4EGAAPOLBSMN1; SMN2THRA
SCHEMBL5861645 0.83 POLB (0.42) MEN1KMT2AKDM4EGAAPOLB
SCHEMBL5844406 0.83 MEN1 (0.36) MEN1KMT2AGAAPPARATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7109311-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-09-19 US disclosed
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040167322-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process POLL, VEGFA, PIM3 MEN1 3908/4885KMT2A 660/4885KDM4E 1704/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.