SCHEMBL5843889

SCHEMBL5843889

CCCCOc1cc(C)c(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C2CCCCC2)cc1OCCCC

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 4/20 0.38
TSHR P16473 2/20 0.38
LMNA P02545 2/20 0.38
GAA P10253 1/20 0.38
MAPT P10636 1/20 0.38
PPARG P37231 3/20 0.34
SMN1; SMN2 Q16637 2/20 0.33
MAPK1 P28482 1/20 0.33
SCN9A Q15858 1/20 0.33
KDM4E B2RXH2 1/20 0.33
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
MCOLN3 Q8TDD5 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
PTGES O14684 1/20 0.32
ALOX5 P09917 1/20 0.32
CNR2 P34972 3/20 0.32
FAAH O00519 2/20 0.32
RARB P10826 1/20 0.31
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5845626 0.86 LMNA (0.38) HTTTSHRLMNAMAPTSMN1; SMN2
SCHEMBL5862518 0.85 MEN1 (0.45) TSHRGAAPPARGSMN1; SMN2KDM4E
SCHEMBL5845432 0.84 ALOX5 (0.41) HTTTSHRLMNAGAAMAPT
SCHEMBL5842847 0.84 PTGES (0.39) HTTTSHRLMNAGAAMAPT
SCHEMBL5844949 0.83 PPARG (0.38) HTTTSHRLMNAGAAMAPT
SCHEMBL5844749 0.82 LMNA (0.37) HTTTSHRLMNAMAPTSMN1; SMN2
SCHEMBL5861590 0.82 TSHR (0.44) TSHRGAAMAPTPPARGSMN1; SMN2
SCHEMBL5843641 0.82 CNR2 (0.35) TSHRLMNAMAPTPPARGMAPK1
SCHEMBL5843958 0.81 S1PR3 (0.39) HTTTSHRLMNAMAPTSMN1; SMN2
SCHEMBL5845625 0.81 S1PR3 (0.39) HTTTSHRLMNAMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7101651-B2 Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO.,LTD. (JP) 2006-09-05 US disclosed
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166432-A1 Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process VEGFA, POLL, PIM3 HTT 2186/4885TSHR 2355/4885LMNA 597/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.