Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 4/20 | 0.91 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | DNM1 | Q05193 | 7/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrapropylammonium SCHEMBL28586534 | 0.96 | SLC22A1 (0.83) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapropylammonium SCHEMBL26108365 | 0.96 | SLC22A1 (0.83) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapropylammonium SCHEMBL5490456 | 0.95 | SLC22A1 (1.00) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapropylammonium SCHEMBL59838 | 0.95 | SLC22A1 (1.00) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapropylammonium SCHEMBL15414074 | 0.92 | SLC22A1 (0.77) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapropylammonium SCHEMBL28472624 | 0.92 | SLC22A1 (0.77) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapropylammonium SCHEMBL2723645 | 0.91 | SLC22A1 (0.91) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapropylammonium SCHEMBL9302417 | 0.91 | SLC22A1 (0.91) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapropylammonium SCHEMBL2723643 | 0.91 | SLC22A1 (0.91) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapropylammonium SCHEMBL4552588 | 0.91 | SLC22A1 (0.91) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1173 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117143592-B | Mn (Mn)4+Activated fluoride (oxide) red fluorescent material and preparation method thereof | 华南理工大学 | 2026-05-22 | — | — | CN | claimed |
| CN-121507131-B | Fluoride ion solid polymer electrolyte and preparation method and application thereof | 苏州大学 | 2026-05-15 | — | — | CN | claimed |
| CN-116145156-B | Indoline compound preparation method based on organic electronic synthesis | 六盘水师范学院 | 2026-05-15 | — | — | CN | claimed |
| US-12624318-B2 | Cleaning agent composition and cleaning method | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-12 | — | — | US | claimed |
| US-20260117393-A1 | ETCHING AGENT COMPOSITION AND ETCHING METHOD USING THE SAME | KCTECH CO., LTD. (KR) | 2026-04-30 | — | — | US | claimed |
| US-20260071152-A1 | CLEANING METHOD | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-12 | — | — | US | claimed |
| US-20250376645-A1 | METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | claimed |
| EP-4661058-A1 | CLEANING AGENT COMPOSITION AND CLEANING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-10 | — | — | EP | claimed |
| US-12441964-B2 | Cleaning agent composition and cleaning method | NISSAN CHEMICAL CORPORATION (JP) | 2025-10-14 | — | — | US | claimed |
| US-20250263633-A1 | CLEANING AGENT COMPOSITION AND CLEANING METHOD | NISSAN CHEMICAL CORPORATION (JP) | 2025-08-21 | — | — | US | claimed |
| US-20070000523-A1 | Cleaning composition and related methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-01-04 | — | — | US | claimed |
| US-20060287207-A1 | Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-12-21 | — | — | US | claimed |
| EP-1457550-B1 | Composition for removing residues from the microstructure of an object | AIR PROD & CHEM (US) | 2006-07-05 | — | — | EP | claimed |
| EP-1453080-B1 | Process and composition for removing residues from the microstructure of an object | AIR PROD & CHEM (US) | 2006-07-05 | — | — | EP | claimed |
| WO-2005053004-A1 | SELECTIVE REMOVAL CHEMISTRIES FOR SACRIFICIAL LAYERS METHODS OF PRODUCTION AND USES THEREOF | HONEYWELL INTERNATIONAL INC. (US) | 2005-06-09 | — | — | WO | claimed |
| US-20040198627-A1 | Process and apparatus for removing residues from the microstructure of an object | KOBE STEEL, LTD. | 2004-10-07 | — | — | US | claimed |
| US-20040192572-A1 | Process and composition for removing residues from the microstructure of an object | KOBE STEEL, LTD. | 2004-09-30 | — | — | US | claimed |
| EP-1457550-A2 | Composition for removing residues from the microstructure of an object | KABUSHIKI KAISHA KOBE SEIKO SHO (JP) | 2004-09-15 | — | — | EP | claimed |
| EP-1453080-A1 | Process and composition for removing residues from the microstructure of an object | KABUSHIKI KAISHA KOBE SEIKO SHO (JP) | 2004-09-01 | — | — | EP | claimed |
| EP-1095940-B1 | Derivatives of 9-(3,5-dimethoxyphenyl)-5,8,8a,9-tetrahydrofuro[3',4':6,7]naphto[2,3-d][1,3]dioxol-6(5aH)-one, method for their preparation and pharmaceutical compositions containing them | SERVIER LAB (FR) | 2004-07-21 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260071152-A1 | CLEANING METHOD | FGB, CDH1, RNF168 | SLC22A1 4536/4885SLC22A2 4602/4885ALDH1A1 3227/4885 |
| US-12624318-B2 | Cleaning agent composition and cleaning method | DNMT1, TLN1, TET2 | SLC22A1 4063/4885SLC22A2 4067/4885ALDH1A1 2705/4885 |
| US-20260117393-A1 | ETCHING AGENT COMPOSITION AND ETCHING METHOD USING THE SAME | HCN4, HAO2, ASIC1 | SLC22A1 2193/4885SLC22A2 2184/4885ALDH1A1 3043/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.