Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSPA5 | P11021 | 2/20 | 0.57 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.43 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 4/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | IDO1 | P14902 | 2/20 | 0.41 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.41 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.41 |
| ▸ | CASP1 | P29466 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | BLM | P54132 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13899836 | 0.91 | TRPA1 (0.50) | HSPA5TRPA1HIF1AMEN1CYP3A4 | |
| SCHEMBL9307175 | 0.84 | MEN1 (0.57) | TRPA1KEAP1HIF1AMEN1CYP3A4 | |
| SCHEMBL28629080 | 0.81 | TRPA1 (0.46) | HSPA5TRPA1KEAP1HIF1AMEN1 | |
| SCHEMBL685704 | 0.77 | TRPA1 (0.48) | TRPA1HIF1ACYP3A4CYP2D6TSHR | |
| SCHEMBL30101971 | 0.77 | TRPA1 (0.48) | TRPA1HIF1ACYP3A4CYP2D6TSHR | |
| SCHEMBL685611 | 0.76 | TRPA1 (0.52) | TRPA1HSP90AA1IAPPGABRA1GABRB2 | |
| SCHEMBL49745 | 0.76 | HSPA5 (1.00) | HSPA5KEAP1HIF1ACYP3A4HPGD | |
| SCHEMBL15524685 | 0.76 | TRPA1 (0.47) | TRPA1MEN1CYP3A4HPGDKMT2A | |
| SCHEMBL22160162 | 0.76 | HSPA5 (0.64) | HSPA5KEAP1HIF1AIDO1HSD17B10 | |
| SCHEMBL29357407 | 0.76 | HSPA5 (1.00) | HSPA5KEAP1HIF1ACYP3A4HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1692094-A2 | BOTTOM ANTIREFLECTIVE COATINGS | AZ Electronic Materials USA Corp. (US) | 2006-08-23 | — | — | EP | disclosed |
| US-7030201-B2 | Bottom antireflective coatings | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-04-18 | — | — | US | disclosed |
| WO-2005052016-A2 | BOTTOM ANTIREFLECTIVE COATINGS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2005-06-09 | — | — | WO | disclosed |
| US-20050112494-A1 | Bottom antireflective coatings | AZ ELECTRONIC MATERIALS USA CORP. | 2005-05-26 | — | — | US | disclosed |
| US-6818377-B2 | ACID GENERATOR; RESIN CONTAINING A POLYALICYCLIC GROUP OR A FURANONE, CYCLOPENTANONE, PYRROLIDONE OR TETRAHYDROTHIOPHENONE GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-16 | — | — | US | disclosed |
| US-6808869-B1 | EXCELLENT LIGHT ABSORBANCE WITH HIGH RESOLUTION AND LOW FILM THICKNESS DEPENDENCY; THERMAL CROSSLINKING AGENT AND A LIGHT ABSORBING ADDITION POLYMER WITH PENDANT NAPHTHALENE RING SUBSTITUTED WITH AN ELECTRON DONATING GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 2004-10-26 | — | — | US | disclosed |
| US-20040161697-A2 | Positive Photosensitive Composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-08-19 | — | — | US | disclosed |
| US-6699635-B1 | SUITABLE FOR THE CASES WHEREIN FAR ULTRAVIOLET RAYS HAVING WAVELENGTHS OF 250 NM OR SHORTER ARE USED AS EXPOSURE LIGHT | FUJI PHOTO FILM CO., LTD. (JP) | 2004-03-02 | — | — | US | disclosed |
| EP-0877293-B1 | Positive photosensitive composition | FUJI PHOTO FILM CO LTD (JP) | 2004-01-14 | — | — | EP | disclosed |
| EP-0989463-B1 | Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern | FUJI PHOTO FILM CO LTD (JP) | 2003-04-16 | — | — | EP | disclosed |
| US-6238842-B1 | SUITABLE FOR USE WITH AN EXPOSURE LIGHT HAVING A WAVELENGTH OF 250 NM OR SHORTER, ESPECIALLY 220 NM OR SHORTER; ACID GENERATING COMPOUND; RESIN HAVING MONOVALENT POLYALICYCLIC GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-29 | — | — | US | disclosed |
| US-6165684-A | Bottom anti-reflective coating material composition and method for forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2000-12-26 | — | — | US | disclosed |
| US-6090531-A | UNDERGOES NO INTERMIXING WITH THE RESIST LAYER, PROVIDES AN EXCELLENT RESIST PATTERN AND SHOWS A HIGHER DRY ETCHING RATE THAN RESIST AND A RESIST PATTERN FORMATION PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2000-07-18 | — | — | US | disclosed |
| EP-0989463-A2 | Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern | FUJI PHOTO FILM CO., LTD. (JP) | 2000-03-29 | — | — | EP | disclosed |
| US-6042991-A | COMPOUND THAT GENERATES AN ACID WHEN IRRADIATED WITH ACTINIC RAYS AND A RESIN COMPRISING ALICYCLIC RINGS OF GIVEN FORMULA, THAT HAS GROUPS THAT DECOMPOSE DUE TO ACIDS TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER; DRY ETCH RESISTANCE | FUJI PHOTO FILM CO., LTD. (JP) | 2000-03-28 | — | — | US | disclosed |
| US-5945250-A | CONTAINING A SULFONIUM SALT RESIN; HAVING GOOD SOLUBILITY IN SOLVENT, HIGH PHOTOSENSITIVITY, EXCELLENT RESIST PATTERN AND STABILITY | FUJI PHOTO FILM CO., LTD. (JP) | 1999-08-31 | — | — | US | disclosed |
| EP-0878738-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-11-18 | — | — | EP | disclosed |
| EP-0877293-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-11-11 | — | — | EP | disclosed |
| EP-0851300-A1 | Bottom anti-reflective coating material composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 1998-07-01 | — | — | EP | disclosed |
| EP-0823661-A1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-11 | — | — | EP | disclosed |