Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TRPA1 | O75762 | 1/20 | 0.48 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.46 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.44 |
| ▸ | MMP2 | P08253 | 2/20 | 0.44 |
| ▸ | MMP9 | P14780 | 2/20 | 0.44 |
| ▸ | MMP8 | P22894 | 2/20 | 0.44 |
| ▸ | PKM | P14618 | 1/20 | 0.44 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.42 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.42 |
| ▸ | ADRB2 | P07550 | 7/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.39 |
| ▸ | MMP13 | P45452 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30101971 | 1.00 | TRPA1 (0.48) | TRPA1KLF10NFKB1MMP2MMP9 | |
| SCHEMBL13899836 | 0.85 | TRPA1 (0.50) | TRPA1GABRA1GABRB2ALDH1A1HIF1A | |
| SCHEMBL27837492 | 0.83 | TRPA1 (0.44) | TRPA1KLF10PKMGABRA1GABRB2 | |
| SCHEMBL11928831 | 0.83 | ALDH1A1 (0.43) | TRPA1NFKB1MMP2MMP9MMP8 | |
| SCHEMBL4613626 | 0.82 | GABRA1 (0.66) | TRPA1GABRA1GABRB2ALDH1A1CYP3A4 | |
| SCHEMBL15524685 | 0.82 | TRPA1 (0.47) | TRPA1GABRA1GABRB2ALDH1A1CYP3A4 | |
| SCHEMBL14760945 | 0.82 | TRPA1 (0.47) | TRPA1GABRA1GABRB2ALDH1A1HIF1A | |
| SCHEMBL685611 | 0.82 | TRPA1 (0.52) | TRPA1GABRA1GABRB2ALDH1A1POLB | |
| SCHEMBL7885263 | 0.81 | TRPA1 (0.43) | TRPA1NFKB1MMP2MMP9MMP8 | |
| SCHEMBL28629080 | 0.80 | TRPA1 (0.46) | TRPA1GABRA1GABRB2ALDH1A1HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 160 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117631453-A | Negative photoresist composition, preparation method and application thereof | 彤程化学（中国）有限公司 | 2024-03-01 | — | — | CN | claimed |
| CN-106543012-A | A kind of synthetic method of cold labeling beta receptor agonist | 上海化工研究院 | 2017-03-29 | — | — | CN | claimed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-117631453-A | Negative photoresist composition, preparation method and application thereof | 彤程化学（中国）有限公司 | 2024-03-01 | — | — | CN | disclosed |
| CN-108341961-B | Preparation and application of dynamic polymer containing combined dynamic covalent bonds | 厦门天策材料科技有限公司 | 2023-08-25 | — | — | CN | disclosed |
| CN-108341960-B | Dynamic polymer containing combined dynamic covalent bonds and application thereof | 厦门天策材料科技有限公司 | 2023-08-25 | — | — | CN | disclosed |
| CN-111040204-B | Force-induced response dynamic polymer and application thereof | 厦门天策材料科技有限公司 | 2023-01-24 | — | — | CN | disclosed |
| US-20220221793-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| CN-114660896-A | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2022-06-24 | — | — | CN | disclosed |
| CN-111378165-A | Combined hybrid cross-linked dynamic polymer and application thereof | 翁秋梅 | 2020-07-07 | — | — | CN | disclosed |
| CN-111378168-A | Combined energy absorption method and application thereof | 翁秋梅 | 2020-07-07 | — | — | CN | disclosed |
| US-6898015-B2 | MICROLENS ARRAY, A METHOD FOR MAKING A TRANSFER MASTER PATTERN FOR MICROLENS ARRAY, A CONCAVE AND CONVEX PATTERN OBTAINED FROM THE TRANSFER MASTER PATTERN, A LAMINATE FOR TRANSFER, A DIFFUSE REFLECTION PLATE AND A LIQUID CRYSTAL DISPLAY DEVICE | HITACHI, LTD. (JP) | 2005-05-24 | — | — | US | disclosed |
| EP-1531058-A1 | Positive-type photosensitive composition | THINK LABORATORY CO., LTD. (JP) | 2005-05-18 | — | — | EP | disclosed |
| US-20050100816-A1 | Positive-type photosensitive composition | THINK LABORATORY CO., LTD. (JP) | 2005-05-12 | — | — | US | disclosed |
| US-20050100826-A1 | PHOTOGRAVURE PLATE MAKING METHOD | THINK LABORATORY CO., LTD. (JP) | 2005-05-12 | — | — | US | disclosed |
| US-20050041295-A1 | Microlens array, a method for making a transfer master pattern for microlens array, a concave and convex pattern obtained from the transfer master pattern, a laminate for transfer, a diffuse reflection plate and a liquid crystal display device | YOSHIKAWA TAKEHISA (JP) | 2005-02-24 | — | — | US | disclosed |
| US-20040061946-A1 | Microlens array, a method for making a transfer master pattern for microlens array, a concave and convex pattern obtained from the transfer master pattern, a laminate for transfer, a diffuse reflection plate and a liquid crystal display device | YOSHIKAWA TAKEHISA (JP) | 2004-04-01 | — | — | US | disclosed |
| US-6654176-B2 | Lens face of microlens configuration is formed according to cutting system; diffuse reflector pattern used in liquid crystal display has good reflection characteristics; preset of concave and convex faces permits control of reflectivity | HITACHI, LTD. (JP) | 2003-11-25 | — | — | US | disclosed |
| US-20030039035-A1 | Microlens array, a method for making a transfer master pattern for microlens array, a concave and convex pattern obtained from the transfer master pattern, a laminate for transfer, a diffuse reflection plate and a liquid crystal display device | HITACHI, LTD. (JP) | 2003-02-27 | — | — | US | disclosed |
| US-5821016-A | PHOTOPOLYMERIZATION OF UNSATURATED BOND IN COPOLYMERS WITH CARBOXYL GROUPS, PIGMENTS AND OPTICAL SENSITIZERS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1998-10-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220221793-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND SILICON COMPOUND | SMC1A, CDH1, SMC4 | TRPA1 3632/4885KLF10 1505/4885NFKB1 3130/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.